Invention Grant
- Patent Title: Method of producing a piezoelectric thin film
- Patent Title (中): 制造压电薄膜的方法
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Application No.: US08807724Application Date: 1997-02-28
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Publication No.: US06543107B1Publication Date: 2003-04-08
- Inventor: Satoru Miyashita , Masakazu Shinozuka , Tetsushi Takahashi
- Applicant: Satoru Miyashita , Masakazu Shinozuka , Tetsushi Takahashi
- Priority: JP7-31035 19950220; JP7-322662 19951212
- Main IPC: H04R1700
- IPC: H04R1700

Abstract:
A method for producing the piezoelectric thin film is based on a sol-gel process and comprises the steps of: coating a substrate with a sol composition comprising a sol, of a metal component for constituting a piezoelectric film, and a polymer compound and then drying the coating to form a film; pre-sintering the film to form a porous thin film of gel comprising an amorphous metal oxide; pre-annealing the porous thin film of gel to convert the film to a film of a crystalline metal oxide; repeating the steps at least once to form laminated films of a crystalline metal oxide; and annealing the films thus prepared to grow crystal grains of perovskite type in the film into a larger size.
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