发明授权
- 专利标题： Method and apparatus for forming deposition film, and method for treating substrate
- 专利标题（中）： 用于形成沉积膜的方法和装置及其处理方法
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申请号： US09844071申请日： 2001-04-30
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公开(公告)号： US06562400B2公开(公告)日： 2003-05-13
- 发明人: Hideo Tamura , Masahiro Kanai , Yasuyoshi Takai , Hiroshi Shimoda , Hidetoshi Tsuzuki
- 申请人： Hideo Tamura , Masahiro Kanai , Yasuyoshi Takai , Hiroshi Shimoda , Hidetoshi Tsuzuki
- 优先权： JP2000-131900 20000501; JP2001-131533 20010427
- 主分类号： B05D312
- IPC分类号： B05D312
摘要：
A gas adsorptive member is disposed in a space communicating with film deposition chambers, and deposition films are deposited while continuously feeding gas components released from this member, thereby enabling the high quality and uniform deposition films to be formed on the substrate with good reproducibility.
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