Invention Grant
- Patent Title: Field effect transistor with an improved gate contact and method of fabricating the same
-
Application No.: US09848085Application Date: 2001-05-03
-
Publication No.: US06566718B2Publication Date: 2003-05-20
- Inventor: Karsten Wieczorek , Rolf Stephan , Manfred Horstmann , Stephan Kruegel
- Applicant: Karsten Wieczorek , Rolf Stephan , Manfred Horstmann , Stephan Kruegel
- Priority: DE10056871 20001116
- Main IPC: H01L2976
- IPC: H01L2976

Abstract:
A field effect transistor comprises a gate electrode contact of a highly conductive material that contacts the gate electrode and extends in the transistor width dimension at least along a portion of the channel. Thus, the gate resistance and the gate signal propagation time for a voltage applied to the gate contact is significantly reduced even for devices with an extremely down scaled gate length. Moreover, a method for fabricating the above FET is disclosed.
Public/Granted literature
- US20020056879A1 Field effect transistor with an improved gate contact and method of fabricating the same Public/Granted day:2002-05-16
Information query