Invention Grant
- Patent Title: Optical material and optical element using the same
- Patent Title (中): 光学材料和光学元件使用相同
-
Application No.: US09797881Application Date: 2001-03-05
-
Publication No.: US06569534B2Publication Date: 2003-05-27
- Inventor: Kenji Yamaguchi , Kazuki Mizushima
- Applicant: Kenji Yamaguchi , Kazuki Mizushima
- Priority: JP2000-083519 20000324; JP2000-158135 20000529; JP2000-249281 20000821
- Main IPC: B32B700
- IPC: B32B700

Abstract:
An optical material including a crystalline silicon and FexSi2 in the form of dots, islands, or a film is provided. The FexSi2 has a symmetrical monoclinic crystalline structure belonging to the P21/c space group and is synthesized at the surface or in the interior of the crystalline silicon. The monoclinic structure corresponds to a deformed structure of &bgr;-FeSi2 generated by heteroepitaxial stress between the {110} plane of the FexSi2 and the {111} plane of the crystalline silicon. The value of x is 0.85≦x≦1.1. An optical element using the optical material is also provided.
Public/Granted literature
- US20010032982A1 Optical material and optical element using the same Public/Granted day:2001-10-25
Information query