发明授权
- 专利标题： Optical material and optical element using the same
- 专利标题（中）： 光学材料和光学元件使用相同
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申请号： US09797881申请日： 2001-03-05
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公开(公告)号： US06569534B2公开(公告)日： 2003-05-27
- 发明人: Kenji Yamaguchi , Kazuki Mizushima
- 申请人： Kenji Yamaguchi , Kazuki Mizushima
- 优先权： JP2000-083519 20000324; JP2000-158135 20000529; JP2000-249281 20000821
- 主分类号： B32B700
- IPC分类号： B32B700
摘要：
An optical material including a crystalline silicon and FexSi2 in the form of dots, islands, or a film is provided. The FexSi2 has a symmetrical monoclinic crystalline structure belonging to the P21/c space group and is synthesized at the surface or in the interior of the crystalline silicon. The monoclinic structure corresponds to a deformed structure of &bgr;-FeSi2 generated by heteroepitaxial stress between the {110} plane of the FexSi2 and the {111} plane of the crystalline silicon. The value of x is 0.85≦x≦1.1. An optical element using the optical material is also provided.
公开/授权文献
- US20010032982A1 Optical material and optical element using the same 公开/授权日：2001-10-25
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