发明授权
US06570320B1 Device for shaping an electron beam, method for producing said device and use thereof
失效
用于成形电子束的装置,用于制造所述装置的方法及其用途
- 专利标题: Device for shaping an electron beam, method for producing said device and use thereof
- 专利标题(中): 用于成形电子束的装置,用于制造所述装置的方法及其用途
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申请号: US09701894申请日: 2000-12-04
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公开(公告)号: US06570320B1公开(公告)日: 2003-05-27
- 发明人: Klaus Burkhardt , Wolfgang Eckhardt , Silvia Gohlke , Ruth Männer , Wolfram Wersing
- 申请人: Klaus Burkhardt , Wolfgang Eckhardt , Silvia Gohlke , Ruth Männer , Wolfram Wersing
- 优先权: DE19824783 19980603
- 主分类号: H01J6304
- IPC分类号: H01J6304
摘要:
The invention is directed to an extremely low-capacitance device for shaping an electron beam. The device is based on a ceramic body having a monolithic multi-layer structure. The manufacture of the ceramic body ensues with the assistance of LTCC technology, whereby this method is designationally modified. The body is constructed of pre-sintered ceramic layers whose lateral shrinkage is suppressed. The through apertures of the electrodes for the electron beam are thus arranged exactly coaxially, and the tolerances of the electrode dimensions are decoupled from the shrinkage during sintering. The electron beam of an electron gun is focused and the intensity thereof is modulated with the assistance of such a device.
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