Device for shaping an electron beam, method for producing said device and use thereof
    2.
    发明授权
    Device for shaping an electron beam, method for producing said device and use thereof 失效
    用于成形电子束的装置,用于制造所述装置的方法及其用途

    公开(公告)号:US06570320B1

    公开(公告)日:2003-05-27

    申请号:US09701894

    申请日:2000-12-04

    IPC分类号: H01J6304

    摘要: The invention is directed to an extremely low-capacitance device for shaping an electron beam. The device is based on a ceramic body having a monolithic multi-layer structure. The manufacture of the ceramic body ensues with the assistance of LTCC technology, whereby this method is designationally modified. The body is constructed of pre-sintered ceramic layers whose lateral shrinkage is suppressed. The through apertures of the electrodes for the electron beam are thus arranged exactly coaxially, and the tolerances of the electrode dimensions are decoupled from the shrinkage during sintering. The electron beam of an electron gun is focused and the intensity thereof is modulated with the assistance of such a device.

    摘要翻译: 本发明涉及用于成形电子束的极低电容器件。 该装置基于具有单片多层结构的陶瓷体。 在LTCC技术的帮助下,陶瓷体的制造是由这种方法进行的。 本体由预烧结的陶瓷层构成,其横向收缩被抑制。 因此,用于电子束的电极的通孔精确地同轴布置,并且电极尺寸的公差与烧结期间的收缩率分离。 聚焦电子枪的电子束,并借助这种装置调制其强度。