发明授权
US06583071B1 Ultrasonic spray coating of liquid precursor for low K dielectric coatings
失效
用于低K电介质涂层的液体前体的超声波喷涂
- 专利标题： Ultrasonic spray coating of liquid precursor for low K dielectric coatings
- 专利标题（中）： 用于低K电介质涂层的液体前体的超声波喷涂
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申请号： US09692660申请日： 2000-10-18
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公开(公告)号： US06583071B1公开(公告)日： 2003-06-24
- 发明人: Timothy Weidman , Yunfeng Lu , Michael P Nault , Michael Barnes , Farhad Moghadam
- 申请人： Timothy Weidman , Yunfeng Lu , Michael P Nault , Michael Barnes , Farhad Moghadam
- 主分类号： H01L2131
- IPC分类号： H01L2131
摘要：
A process for forming a extremely low dielectric constant film over a substrate. The process includes coating a substrate with a solution comprising a soluble source of silicon oxide, water, a solvent, a surfactant and a catalyst using an ultrasonic spray nozzle. The coated substrate is then subsequently treated to harden the solution into an extremely low dielectric constant film.