Invention Grant
- Patent Title: Nitride semiconductor light-emitting element and method for fabricating the same
- Patent Title (中): 氮化物半导体发光元件及其制造方法
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Application No.: US09773508Application Date: 2001-02-02
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Publication No.: US06590234B2Publication Date: 2003-07-08
- Inventor: Chin Kyo Kim , Tae Kyung Yoo
- Applicant: Chin Kyo Kim , Tae Kyung Yoo
- Priority: KR2000-5380 20000203
- Main IPC: H01L3300
- IPC: H01L3300

Abstract:
A nitride semiconductor light-emitting element is disclosed. An n type AlGaN cladding layer is grown on a GaN substrate, and an InGaN active layer of a quantum well structure is grown on the n type AlGaN cladding layer at a temperature of about 800° C. or less. Subsequently, a buffer layer of any one of GaN, AlGaN, and InGaN is grown on the InGaN active layer at a temperature of about 900° C. or less. A p type AlGaN cladding layer and a p type GaN electrode layer are sequentially grown on the buffer layer. A p type electrode is formed over the p type GaN electrode layer while an n type electrode is formed below the substrate or over the n type cladding layer. Thus, the nitride semiconductor light-emitting element having high efficiency optical characteristic and thermal characteristic can be obtained.
Public/Granted literature
- US20010011731A1 Nitride semiconductor light-emitting element and method for fabricating the same Public/Granted day:2001-08-09
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