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US06590234B2 Nitride semiconductor light-emitting element and method for fabricating the same 失效
氮化物半导体发光元件及其制造方法

  • Patent Title: Nitride semiconductor light-emitting element and method for fabricating the same
  • Patent Title (中): 氮化物半导体发光元件及其制造方法
  • Application No.: US09773508
    Application Date: 2001-02-02
  • Publication No.: US06590234B2
    Publication Date: 2003-07-08
  • Inventor: Chin Kyo KimTae Kyung Yoo
  • Applicant: Chin Kyo KimTae Kyung Yoo
  • Priority: KR2000-5380 20000203
  • Main IPC: H01L3300
  • IPC: H01L3300
Nitride semiconductor light-emitting element and method for fabricating the same
Abstract:
A nitride semiconductor light-emitting element is disclosed. An n type AlGaN cladding layer is grown on a GaN substrate, and an InGaN active layer of a quantum well structure is grown on the n type AlGaN cladding layer at a temperature of about 800° C. or less. Subsequently, a buffer layer of any one of GaN, AlGaN, and InGaN is grown on the InGaN active layer at a temperature of about 900° C. or less. A p type AlGaN cladding layer and a p type GaN electrode layer are sequentially grown on the buffer layer. A p type electrode is formed over the p type GaN electrode layer while an n type electrode is formed below the substrate or over the n type cladding layer. Thus, the nitride semiconductor light-emitting element having high efficiency optical characteristic and thermal characteristic can be obtained.
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