发明授权
- 专利标题: Thermal infrared sensor and a method of manufacturing the same
- 专利标题(中): 热红外传感器及其制造方法
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申请号: US09819898申请日: 2001-03-29
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公开(公告)号: US06599771B2公开(公告)日: 2003-07-29
- 发明人: Naoya Mashio , Yoshinori Iida , Keitaro Shigenaka
- 申请人: Naoya Mashio , Yoshinori Iida , Keitaro Shigenaka
- 优先权: JP2000-095812 20000330
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
A thermal type infrared sensor and a method of manufacturing the same that have a high degree of freedom of structure and a low cost. An infrared ray detecting portion and a support leg are formed above flat plate-shape void formed inside of a semiconductor substrate, and a processing circuit section of a signal from a detecting portion is fabricated on the semiconductor substrate. Because the structure of the processing circuit section is not influenced by a substrate structure, characteristics are improved. Furthermore, the structure is simplified, and it is possible to reduce a manufacturing cost.
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