发明授权
- 专利标题: Method of manufacturing a processing apparatus
- 专利标题(中): 制造处理装置的方法
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申请号: US09550015申请日: 2000-04-14
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公开(公告)号: US06625862B2公开(公告)日: 2003-09-30
- 发明人: Morio Kajiyama , Sakae Nakatsuka , Yasushi Aiba
- 申请人: Morio Kajiyama , Sakae Nakatsuka , Yasushi Aiba
- 优先权: JP11-110147 19990416
- 主分类号: C23C1600
- IPC分类号: C23C1600
摘要:
A wafer processing apparatus (14) has a wafer processing vessel (16). A wafer is mounted on a susceptor (22) included in the wafer processing apparatus. Process gases are supplied to the wafer through a shower head (74) disposed in an upper region within the processing vessel to carry out a predetermined process for processing the wafer. The surfaces of aluminum members (16, 74) employed in the wafer processing apparatus are subjected to an organic mechanical chemical polishing process, a blasting process and an aluminum oxide film forming process in that order. It is difficult for unnecessary films to adhere to the thus treated surfaces and it is difficult for unnecessary films deposited on the thus treated surfaces to come off the surfaces. Consequently, intervals between cleaning operations can be extended and production of particles can be suppressed.
公开/授权文献
- US20030010446A1 METHOD OF MANUFACTURING A PROCESSING APPARATUS 公开/授权日:2003-01-16