发明授权
- 专利标题： Method of manufacturing material for forming insulating film
- 专利标题（中）： 制造绝缘膜材料的方法
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申请号： US09760784申请日： 2001-01-17
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公开(公告)号： US06642352B2公开(公告)日： 2003-11-04
- 发明人: Hidenori Suzuki , Katsuyuki Kakinoki , Yoshihisa Nakase , Michinori Nishikawa , Takashi Okada , Kinji Yamada
- 申请人： Hidenori Suzuki , Katsuyuki Kakinoki , Yoshihisa Nakase , Michinori Nishikawa , Takashi Okada , Kinji Yamada
- 优先权： JP2000-007385 20000117; JP2000-175684 20000612
- 主分类号： C08F600
- IPC分类号： C08F600
摘要：
A method of manufacturing an insulating film-forming material comprising a curable composition comprisING (A) an inorganic polymer compound or an organic polymer compound and (B) an organic solvent, which comprises treating the curable composition with a zeta potential-producing filter material. Because the curable composition has a very small content of alkali metals and heavy metals, the composition is suitably used for the manufacture of materials for forming insulating films which have a wide variety of applications in the electronic field.