公开(公告)号：US06642352B2

公开(公告)日：2003-11-04

申请号：US09760784

申请日：2001-01-17

申请人： Hidenori Suzuki ,  Katsuyuki Kakinoki ,  Yoshihisa Nakase ,  Michinori Nishikawa ,  Takashi Okada ,  Kinji Yamada

发明人： Hidenori Suzuki ,  Katsuyuki Kakinoki ,  Yoshihisa Nakase ,  Michinori Nishikawa ,  Takashi Okada ,  Kinji Yamada

IPC分类号： C08F600

CPC分类号： C08G77/34 ,  H01B3/42 ,  H01B3/442 ,  H01B3/46

摘要： A method of manufacturing an insulating film-forming material comprising a curable composition comprisING (A) an inorganic polymer compound or an organic polymer compound and (B) an organic solvent, which comprises treating the curable composition with a zeta potential-producing filter material. Because the curable composition has a very small content of alkali metals and heavy metals, the composition is suitably used for the manufacture of materials for forming insulating films which have a wide variety of applications in the electronic field.

摘要翻译： 一种制造绝缘膜形成材料的方法，包括含有（A）无机聚合物化合物或有机高分子化合物的固化性组合物和（B）有机溶剂，其包括用ζ电位产生过滤材料处理可固化组合物。 由于可固化组合物的碱金属和重金属含量非常小，所以该组合物适合用于制造在电子领域中具有广泛应用的形成绝缘膜的材料。