发明授权
US06643893B2 Apparatus for cleaning semiconductor wafers in a vacuum environment
失效
用于在真空环境中清洁半导体晶片的装置
- 专利标题: Apparatus for cleaning semiconductor wafers in a vacuum environment
- 专利标题(中): 用于在真空环境中清洁半导体晶片的装置
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申请号: US09809202申请日: 2001-03-16
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公开(公告)号: US06643893B2公开(公告)日: 2003-11-11
- 发明人: Yoshinori Momonoi , Kenetsu Yokogawa , Masaru Izawa , Shinichi Tachi
- 申请人: Yoshinori Momonoi , Kenetsu Yokogawa , Masaru Izawa , Shinichi Tachi
- 优先权: JP2001-007157 20010116
- 主分类号: B08B1100
- IPC分类号: B08B1100
摘要:
A dry cleaning device, wherein a pad is moved towards a surface of a wafer, cleaning gas is injected into a space formed between the pad and the wafer to generate a high-speed gas flow along the surface of the wafer whereby particles left on the surface of the wafer are removed with the high-speed gas flow. In addition, in order to assist this physical cleaning action, either a chemical or an electrical cleaning method such as a plasma additionally may be used.
公开/授权文献
- US20020092121A1 Dry cleaning apparatus 公开/授权日:2002-07-18