- 专利标题： Method of manufacturing a photomask
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申请号： US09924769申请日： 2001-08-09
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公开(公告)号： US06656645B2公开(公告)日： 2003-12-02
- 发明人: Toshihiko Tanaka , Norio Hasegawa , Tsuneo Terasawa
- 申请人： Toshihiko Tanaka , Norio Hasegawa , Tsuneo Terasawa
- 优先权： JP2000-246506 20000815
- 主分类号： G03F900
- IPC分类号： G03F900
摘要：
After a shade pattern constituted by a resist film formed on a photomask is stripped, a new shade pattern constituted by a resist film is formed on the photomask to reclaim a photomask.
公开/授权文献
- US20020022184A1 Method of manufacturing a photomask 公开/授权日：2002-02-21
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