发明授权
- 专利标题： HF etching and oxide scale removal
- 专利标题（中）： HF蚀刻和氧化皮去除
-
申请号： US09223359申请日： 1998-12-30
-
公开(公告)号： US06670281B2公开(公告)日： 2003-12-30
- 发明人: Matthew H. Luly , Rajiv R. Singh , Charles L. Redmon , Jeffrey W. McKown , Robert Pratt
- 申请人： Matthew H. Luly , Rajiv R. Singh , Charles L. Redmon , Jeffrey W. McKown , Robert Pratt
- 主分类号： H01C21302
- IPC分类号： H01C21302
摘要：
Methods for etching or removing oxide scale from a substrate by applying a composition containing a polymer and an effective amount of hydrofluoric acid and maintaining the composition on the substrate until the substrate is etched or the oxide scale is removed.
公开/授权文献
- US20020063106A1 HF ETCHING AND OXIDE SCALE REMOVAL 公开/授权日：2002-05-30