发明授权
- 专利标题： Polymer suitable for photoresist compositions
- 专利标题（中）： 适用于光刻胶组合物的聚合物
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申请号： US09854312申请日： 2001-05-11
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公开(公告)号： US06686429B2公开(公告)日： 2004-02-03
- 发明人: Ralph R. Dammel , Raj Sakamuri
- 申请人： Ralph R. Dammel , Raj Sakamuri
- 主分类号： C08F12042
- IPC分类号： C08F12042
摘要：
The present invention relates to a novel polymer comprising at least one unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and at least one nonaromatic cyclic unit. The novel polymer is particularly useful when used in a photoresist composition sensitive in the deep ultraviolet region.
公开/授权文献
- US20030013831A1 NOVEL POLYMER SUITABLE FOR PHOTORESIST COMPOSITIONS 公开/授权日：2003-01-16
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