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公开(公告)号：US20100092895A1
公开(公告)日：2010-04-15
申请号：US12449735
申请日：2008-02-25
申请人： Ruzhi Zhang , Wookyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neissor , Ralph R. Dammel , Ari Karkkainen
发明人： Ruzhi Zhang , Wookyu Kim , David J. Abdallah , PingHung Lu , Mark O. Neissor , Ralph R. Dammel , Ari Karkkainen
CPC分类号： C08G77/045 , C09D183/04 , H01L21/02126 , H01L21/02216 , H01L21/02282 , H01L21/3124
摘要： A polymer comprising a siloxane polymer having at least one Si—OH group and at least one Si—OR group, where R is condensation stabilizing group optionally having a reactive functional group, wherein the siloxane polymer, when placed into a solvent, has a weight average molecular weight increase of less than or equal to 50% after aging for one week at 40° C. as measured by GPC is provided.
摘要翻译： 包含具有至少一个Si-OH基团和至少一个Si-OR基团的硅氧烷聚合物的聚合物，其中R是任选具有反应性官能团的缩合稳定基团，其中所述硅氧烷聚合物在置于溶剂中时具有重量 提供了通过GPC测量的在40℃下老化1周后的平均分子量增加小于或等于50％。
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公开(公告)号：US07537879B2
公开(公告)日：2009-05-26
申请号：US10994745
申请日：2004-11-22
申请人： Francis M. Houlihan , Ralph R. Dammel , Andrew R. Romano , Munirathna Padmanaban , M. Dalil Rahman
发明人： Francis M. Houlihan , Ralph R. Dammel , Andrew R. Romano , Munirathna Padmanaban , M. Dalil Rahman
CPC分类号： G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to a novel chemically amplified photoresist, which is sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a novel polymer comprising a sulfone group pendant from a polymer backbone that is insoluble in an aqueous alkaline solution and comprises at least one acidic moiety protected with acid labile group, and b) a compound capable of producing an acid upon irradiation. The invention also relates to a process of imaging the novel positive photoresist composition.
摘要翻译： 本发明涉及一种对300nm至100nm之间的波长敏感的新型化学放大光致抗蚀剂，并且包括a）一种新型聚合物，其包含不溶于碱性水溶液的聚合物主链的侧基的砜基， 用酸不稳定基团保护的至少一个酸性部分，和b）在照射时能够产生酸的化合物。 本发明还涉及对新型正性光致抗蚀剂组合物进行成像的方法。
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公开(公告)号：US07033728B2
公开(公告)日：2006-04-25
申请号：US10748778
申请日：2003-12-29
申请人： Ralph R. Dammel
发明人： Ralph R. Dammel
CPC分类号： G03F7/0397 , Y10S430/106 , Y10S430/107 , Y10S430/108 , Y10S430/11 , Y10S430/111 , Y10S430/115 , Y10S430/122 , Y10S430/126 , Y10S430/143 , Y10S430/146
摘要： The present invention relates to a photosensitive composition useful at wavelengths between 300 nm and 10 nm which comprises a polymer containing a substituted or unsubstituted higher adamantane.
摘要翻译： 本发明涉及一种可用于300nm至10nm波长的光敏组合物，其包含含有取代或未取代的较高金刚烷的聚合物。
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4.发明授权Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds 有权用于深紫外光刻的光致抗蚀剂组合物，其包含光活性化合物的混合物公开(公告)号：US06991888B2
公开(公告)日：2006-01-31
申请号：US10439472
申请日：2003-05-16
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/115
摘要： The present invention relates to a novel photoresist composition that can be developed with an aqueous alkaline solution, and is capable of being imaged at exposure wavelengths in the deep ultraviolet. The invention also relates to a process for imaging the novel photoresist as well as novel photoacid generators.The novel photoresist comprises a) a polymer containing an acid labile group, and b) a novel mixture of photoactive compounds, where the mixture comprises a lower absorbing compound selected from structure 1 and 2, and a higher absorbing compound selected from structure 4 and 5, where, R1 and R2 R5, R6, R7, R8, and R9 are defined herein; m=1–5; X− is an anion, and Ar is selected from naphthyl, anthracyl, and structure 3, where R30, R31, R32, R33, and R34 are defined herein.
摘要翻译： 本发明涉及一种可用碱性水溶液显影的新型光刻胶组合物，能够在深紫外线的曝光波长下成像。 本发明还涉及用于对新型光致抗蚀剂以及新型光酸产生剂进行成像的方法。 新型光致抗蚀剂包含a）含有酸不稳定基团的聚合物，和b）光活性化合物的新混合物，其中该混合物包含选自结构1和2的较低吸收化合物和选自结构4和5的较高吸收化合物 ，其中R 1和R 2 R 5，R 6，R 7，或N R 8，R 9和R 9在本文中定义; m = 1-5; X - 是阴离子，Ar选自萘基，蒽基和结构3，其中R 30，R 31，R SUB > 32，R 33和R 34在本文中定义。
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公开(公告)号：US06800416B2
公开(公告)日：2004-10-05
申请号：US10042531
申请日：2002-01-09
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0045 , G03F7/0046 , Y10S430/108
摘要： The present invention relates to a novel negative working deep uv photoresist that is developable in an aqueous alkaline solution, and comprises a fluorinated polymer, photoactive compound and a crosslinking agent. The photoresist composition is particularly useful for patterning with exposure wavelengths of 193 nm and 157 nm.
摘要翻译： 本发明涉及一种可在碱性水溶液中显影的新型负极深紫外光致抗蚀剂，其包含氟化聚合物，光活性化合物和交联剂。 光致抗蚀剂组合物特别适用于193nm和157nm的曝光波长的图形化。
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公开(公告)号：US06737215B2
公开(公告)日：2004-05-18
申请号：US09853732
申请日：2001-05-11
申请人： Ralph R. Dammel , Raj Sakamuri
发明人： Ralph R. Dammel , Raj Sakamuri
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0395 , Y10S430/106 , Y10S430/111
摘要： The present invention relates to a photoresist composition sensitive in the deep ultraviolet region and a method of processing the photoresist, where the photoresist comprises a novel copolymer, a photoactive component, and a solvent. The novel copolymer comprises a unit derived from an ethylenically unsaturated compound containing at least one cyano functionality and a unit derived from an unsaturated cyclic non aromatic compound.
摘要翻译： 本发明涉及在深紫外区域敏感的光致抗蚀剂组合物和光致抗蚀剂的加工方法，其中光致抗蚀剂包含新的共聚物，光敏组分和溶剂。 新型共聚物包含衍生自含有至少一个氰基官能团的烯键式不饱和化合物的单元和衍生自不饱和环非芳族化合物的单元。
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公开(公告)号：US06447980B1
公开(公告)日：2002-09-10
申请号：US09619336
申请日：2000-07-19
IPC分类号： G03C1492
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0395 , Y10S430/115
摘要： The present invention relates to a chemically amplified system, which is, sensitive to wavelengths between 300 nm and 100 nm, and comprises a) a polymer that is insoluble an aqueous alkaline solution and comprises at least one acid labile group, b) a compound capable of producing an acid upon radiation. The present invention comprises a polymer that is made from a alicyclic hydrocarbon olefin, an acrylate with a pendant cyclic moeity, and a cyclic anhydride. The present invention also relates to a process for imaging such a photoresist.
摘要翻译： 本发明涉及一种化学放大系统，其对300nm至100nm之间的波长敏感，并且包括a）不溶于碱性水溶液并且包含至少一种酸不稳定基团的聚合物，b）具有能力的化合物 在辐射时产生酸。 本发明包括由脂环烃烯烃，具有侧链环状的丙烯酸酯和环状酸酐制成的聚合物。 本发明还涉及这种光致抗蚀剂的成像方法。
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8.发明授权
公开(公告)号：US5719004A
公开(公告)日：1998-02-17
申请号：US695157
申请日：1996-08-07
CPC分类号： G03F7/091 , G03F7/0226
摘要： A light-sensitive positive photoresist composition containing a film forming novolak resin, a quinone-diazide photoactive compound, a solvent, and a 2,4-dinitro-1-naphthol dye, where the dye is present at a level greater than 0.5 weight percent of the total photoresist composition. The dye reduces the linewidth variation of the resist pattern on a reflective substrate without significantly reducing the lithographic performance of the light-sensitive composition.
摘要翻译： 含有形成酚醛清漆树脂，醌二叠氮化物光活性化合物，溶剂和2,4-二硝基-1-萘酚染料的光敏正性光致抗蚀剂组合物，其中染料以大于0.5重量％的水平存在 的光致抗蚀剂组合物。 染料降低了反射基板上的抗蚀剂图案的线宽变化，而不显着降低光敏组合物的光刻性能。
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公开(公告)号：US5652297A
公开(公告)日：1997-07-29
申请号：US699001
申请日：1996-08-16
申请人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna , Shuji Ding
发明人： Iain McCulloch , Ralph R. Dammel , Dana L. Durham , Ping-Hung Lu , Ming Kang , Dinesh N. Khanna , Shuji Ding
CPC分类号： G03F7/091 , C08F20/60 , C08F8/30 , C08F2800/10 , C08F2800/20 , C08F2810/20
摘要： The present invention relates to a novel aqueous antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and water, where the novel polymer of the antireflective coating comprises at least one unit containing a dye that absorbs from about 180 nm to about 450 nm, at least one unit containing a crosslinking group and at least one unit derived from a hydrophilic vinyl monomer or a vinyl monomer capable of becoming hydrophilic.
摘要翻译： 本发明涉及一种新颖的水性抗反射涂层溶液及其在光刻中的应用。 抗反射涂层溶液包含新的聚合物和水，其中抗反射涂层的新型聚合物包含至少一个含有吸收约180nm至约450nm的染料的单元，至少一个含有交联基团和至少一个 衍生自亲水性乙烯基单体或能够变成亲水性的乙烯基单体的单元。
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10.发明申请SILICON-CONTAINING COMPOSITION FOR FINE PATTERN FORMATION AND METHOD FOR FINE PATTERN FORMATION USING THE SAME 失效用于精细图案形成的含硅组合物及其使用的精细图案形成方法公开(公告)号：US20100255430A1
公开(公告)日：2010-10-07
申请号：US12733451
申请日：2008-09-12
CPC分类号： H01L21/0273 , G03F7/0757 , G03F7/405
摘要： The present invention provides a composition for forming a fine pattern with high dry etching resistance and a method for forming the fine pattern. The composition for fine pattern formation containing: a resin containing a repeating unit having a silazane bond; and a solvent as well as a method for fine pattern formation using the same.
摘要翻译： 本发明提供了一种用于形成具有高耐干蚀刻性的精细图案的组合物和形成精细图案的方法。 精细图案形成用组合物，含有含有具有硅氮烷键的重复单元的树脂; 和溶剂以及使用其形成精细图案的方法。
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