Invention Grant
US06686640B2 Varactor having improved Q-factor and method of fabricating the same using SiGe heterojunction bipolar transistor
有权
具有改进的Q因子的变容二极管及其使用SiGe异质结双极晶体管的制造方法
- Patent Title: Varactor having improved Q-factor and method of fabricating the same using SiGe heterojunction bipolar transistor
- Patent Title (中): 具有改进的Q因子的变容二极管及其使用SiGe异质结双极晶体管的制造方法
-
Application No.: US10044107Application Date: 2002-01-11
-
Publication No.: US06686640B2Publication Date: 2004-02-03
- Inventor: Bongki Mheen , Dongwoo Suh , Jin-Yeong Kang
- Applicant: Bongki Mheen , Dongwoo Suh , Jin-Yeong Kang
- Priority: KR2001-57175 20010917
- Main IPC: H01L2993
- IPC: H01L2993

Abstract:
A varactor includes a semiconductor substrate of a first conductivity type, a high-concentration buried collector region of a second conductivity type formed in an upper portion of the semiconductor substrate, a collector region of the second conductivity type formed on a first surface of the high-concentration buried collector region, a high-concentration collector contact region of the second conductivity type formed on a second surface of the high-concentration buried collector region, a high-concentration silicon-germanium base region of the first conductivity type formed on the collector region, a metal silicide layer formed on the silicon-germanium base region, a first electrode layer formed to contact the metal silicide layer, and a second electrode layer formed to be electrically connected to the collector contact region.
Public/Granted literature
Information query