Invention Grant
US06686640B2 Varactor having improved Q-factor and method of fabricating the same using SiGe heterojunction bipolar transistor 有权
具有改进的Q因子的变容二极管及其使用SiGe异质结双极晶体管的制造方法

  • Patent Title: Varactor having improved Q-factor and method of fabricating the same using SiGe heterojunction bipolar transistor
  • Patent Title (中): 具有改进的Q因子的变容二极管及其使用SiGe异质结双极晶体管的制造方法
  • Application No.: US10044107
    Application Date: 2002-01-11
  • Publication No.: US06686640B2
    Publication Date: 2004-02-03
  • Inventor: Bongki MheenDongwoo SuhJin-Yeong Kang
  • Applicant: Bongki MheenDongwoo SuhJin-Yeong Kang
  • Priority: KR2001-57175 20010917
  • Main IPC: H01L2993
  • IPC: H01L2993
Varactor having improved Q-factor and method of fabricating the same using SiGe heterojunction bipolar transistor
Abstract:
A varactor includes a semiconductor substrate of a first conductivity type, a high-concentration buried collector region of a second conductivity type formed in an upper portion of the semiconductor substrate, a collector region of the second conductivity type formed on a first surface of the high-concentration buried collector region, a high-concentration collector contact region of the second conductivity type formed on a second surface of the high-concentration buried collector region, a high-concentration silicon-germanium base region of the first conductivity type formed on the collector region, a metal silicide layer formed on the silicon-germanium base region, a first electrode layer formed to contact the metal silicide layer, and a second electrode layer formed to be electrically connected to the collector contact region.
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