发明授权
- 专利标题: Toroidal plasma source for plasma processing
- 专利标题(中): 用于等离子体处理的环形等离子体源
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申请号: US10170827申请日: 2002-06-12
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公开(公告)号: US06712020B2公开(公告)日: 2004-03-30
- 发明人: Michael S. Cox , Canfeng Lai , Robert B. Majewski , David P. Wanamaker , Christopher T. Lane , Peter Loewenhardt , Shamouil Shamouilian , John P. Parks
- 申请人: Michael S. Cox , Canfeng Lai , Robert B. Majewski , David P. Wanamaker , Christopher T. Lane , Peter Loewenhardt , Shamouil Shamouilian , John P. Parks
- 主分类号: C23C1600
- IPC分类号: C23C1600
摘要:
A toroidal plasma source (28) within a substrate processing chamber (10). The toroidal plasma source forms a poloidal plasma with theta symmetry. The poloidal plasma current is essentially parallel to a surface of the plasma generating structure, thus reducing sputtering erosion of the inner walls. The plasma current is similarly essentially parallel to a process surface (32) of a substrate (34) within the chamber. In a further embodiment, a shaped member (66) between the substrate and the plasma source controls the plasma density in a selected fashion to enhance plasma processing uniformity.
公开/授权文献
- US20020157793A1 Toroidal plasma source for plasma processing 公开/授权日:2002-10-31