发明授权
- 专利标题: Beam alignment in a lower column of a scanning electron microscope or the like
- 专利标题(中): 在扫描电子显微镜等的下列中的束对准
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申请号: US10136692申请日: 2002-04-30
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公开(公告)号: US06717143B2公开(公告)日: 2004-04-06
- 发明人: Paul J. Duval , Anastasia Y. Tyurina , Neal T. Sullivan
- 申请人: Paul J. Duval , Anastasia Y. Tyurina , Neal T. Sullivan
- 主分类号: G21K700
- IPC分类号: G21K700
摘要:
An apparatus for imaging the surface of a sample, such as a scanning electron microscope. The apparatus generates a beam of charged particles directed at the surface, and includes an objective lens and an electrostatic lens for controlling the particle beam. The objective lens and the electrostatic lens constitute a compound lens that has an axis. The beam is controlled so that it travels along the axis of the compound lens in order to avoid adverse consequences induced by, for example, mechanical misalignments and as manifested when the focus of one of the objective and electrostatic lenses is changed during operation of the apparatus.
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