Invention Grant
US06746823B2 Fabricating process of non-gap 3-D microstructure array mold core
有权
非间隙3-D微结构阵列模芯的制造工艺
- Patent Title: Fabricating process of non-gap 3-D microstructure array mold core
- Patent Title (中): 非间隙3-D微结构阵列模芯的制造工艺
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Application No.: US10161421Application Date: 2002-06-01
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Publication No.: US06746823B2Publication Date: 2004-06-08
- Inventor: Kun-Lung Lin , Min-Chieh Chou , Cheng-Tang Pan
- Applicant: Kun-Lung Lin , Min-Chieh Chou , Cheng-Tang Pan
- Main IPC: G03F900
- IPC: G03F900

Abstract:
A process of fabricating a non-gap 3-D microstructure array mold core comprises a first step in which a buffer layer is coated on a substrate. A photomask layer is then coated of the buffer layer. A pattern is subsequently formed on the photomask by photo-lithography. The patterned photomask layer is subjected to a reflow by which a microstructure array is formed on the photomask layer. The microstructure array is coated with a metal conductive layer. The microgaps of the microstructure array are eliminated by an electrocasting layer which is coated on the microstructure array. The non-gap microstructure array mold core so fabricated is made into a metal molding tool by microinjection molding or microthermo-pressure molding.
Public/Granted literature
- US20030224253A1 Fabricating process of non-gap 3-D microstructure array mold core Public/Granted day:2003-12-04
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