Invention Grant
- Patent Title: MEMS device with controlled gas space chemistry
- Patent Title (中): 具有可控气体空间化学的MEMS器件
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Application No.: US10101669Application Date: 2002-03-18
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Publication No.: US06746886B2Publication Date: 2004-06-08
- Inventor: Walter M. Duncan , Simon Joshua Jacobs , Michael R. Douglass , Richard O. Gale
- Applicant: Walter M. Duncan , Simon Joshua Jacobs , Michael R. Douglass , Richard O. Gale
- Main IPC: H01L2156
- IPC: H01L2156

Abstract:
A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.
Public/Granted literature
- US20030016337A1 MEMS device with controlled gas space chemistry Public/Granted day:2003-01-23
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