System and method for hinge memory mitigation
    3.
    发明授权
    System and method for hinge memory mitigation 有权
    铰链记忆缓解的系统和方法

    公开(公告)号:US07710635B2

    公开(公告)日:2010-05-04

    申请号:US12047557

    申请日:2008-03-13

    IPC分类号: G02B26/00

    CPC分类号: G02B26/0833

    摘要: System and method for reducing failures due to hinge memory in a microdisplay display system. A preferred embodiment includes setting the state of each micromirror in a digital micromirror device based on an image being displayed, recording a usage history for the micromirrors, and providing a sequence of states to each micromirror when the display system is in an inactive mode. The sequence of states provided to a micromirror is based on the micromirror's usage history. The operation of the micromirrors while a display system containing the digital micromirror device is not in active use can help to reverse or eliminate hinge memory, thereby extending the lifetime of the digital micromirror device.

    摘要翻译: 用于减少由微型显示器显示系统中的铰链存储器引起的故障的系统和方法。 优选实施例包括基于正在显示的图像,记录微镜的使用历史来设置数字微镜装置中的每个微反射镜的状态,以及当显示系统处于非活动模式时向每个微镜提供一系列状态。 提供给微镜的状态序列基于微镜的使用历史。 包含数字微镜装置的显示系统不在使用中的微镜的操作可以帮助逆转或消除铰链存储器,从而延长数字微镜装置的使用寿命。

    MEMS DEVICE WITH CONTROLLED GAS SPACE CHEMISTRY
    4.
    发明申请
    MEMS DEVICE WITH CONTROLLED GAS SPACE CHEMISTRY 有权
    具有控制气体空间化学的MEMS器件

    公开(公告)号:US20100165314A1

    公开(公告)日:2010-07-01

    申请号:US10833527

    申请日:2004-04-28

    IPC分类号: G03B27/54 G02B26/00

    摘要: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.

    摘要翻译: 用于保护在紫外线照射应用中使用的MEMS器件的过程不会由于UV通量和封装气体成分之间的光化学活化而损坏,所述UV通量和封装气体成分由放置在器件封装中的各种润滑剂和钝化剂的排出物形成,以防止粘附 MEMS器件的运动部件。 该方法用金属卤化物膜涂覆MEMS器件和封装的光学窗表面的暴露表面以消除该光化学活化,因此显着地延长了MEMS器件的可靠性和使用寿命。

    MEMS device with controlled gas space chemistry
    8.
    发明授权
    MEMS device with controlled gas space chemistry 有权
    具有可控气体空间化学的MEMS器件

    公开(公告)号:US07763949B2

    公开(公告)日:2010-07-27

    申请号:US10833527

    申请日:2004-04-28

    IPC分类号: H01L21/56

    摘要: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.

    摘要翻译: 用于保护在紫外线照射应用中使用的MEMS器件的过程不会由于UV通量和封装气体成分之间的光化学活化而损坏,所述UV通量和封装气体成分由放置在器件封装中的各种润滑剂和钝化剂的排出物形成,以防止粘附 MEMS器件的运动部件。 该方法用金属卤化物膜涂覆MEMS器件和封装的光学窗表面的暴露表面以消除该光化学活化,因此显着地延长了MEMS器件的可靠性和使用寿命。

    Reduced deformation of micromechanical devices through thermal stabilization
    9.
    发明授权
    Reduced deformation of micromechanical devices through thermal stabilization 有权
    通过热稳定减少微机械装置的变形

    公开(公告)号:US06204085B1

    公开(公告)日:2001-03-20

    申请号:US09392136

    申请日:1999-09-08

    IPC分类号: H01L2100

    摘要: A method and system of reducing the permanent accumulated deformation of a deflectable member of a micromechanical device through thermal stabilization. The accumulated deformation is due to the repeated bending or twisting of a flexible component of the micromechanical deice typically the repetitive deformation of a flexible hinge connecting a rigid member to substrate. After the device is fabricated, passivated (316), and packaged (322), the packaged device is baked (326) at a temperature of at least 120° C. A 150° C. bake for 12 to 16 hours is preferred. Lower temperatures required longer baking periods.

    摘要翻译: 一种通过热稳定来减少微机械装置的偏转构件的永久累积变形的方法和系统。 累积的变形是由于微机械装置的柔性部件的反复弯曲或扭曲通常是将刚性构件连接到基板的柔性铰链的重复变形。 在器件制造之后,钝化(316)和封装(322),封装的器件在至少120℃的温度下烘烤(326)。优选150℃烘烤12至16小时。 较低的温度需要更长的烘烤时间。

    MEMS device with controlled gas space chemistry
    10.
    发明授权
    MEMS device with controlled gas space chemistry 有权
    具有可控气体空间化学的MEMS器件

    公开(公告)号:US06746886B2

    公开(公告)日:2004-06-08

    申请号:US10101669

    申请日:2002-03-18

    IPC分类号: H01L2156

    摘要: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.

    摘要翻译: 用于保护在紫外线照射应用中使用的MEMS器件的过程不会由于UV通量和封装气体成分之间的光化学活化而损坏,所述UV通量和封装气体成分由放置在器件封装中的各种润滑剂和钝化剂的排出物形成,以防止粘附 MEMS器件的运动部件。 该方法用金属卤化物膜涂覆MEMS器件和封装的光学窗表面的暴露表面以消除该光化学活化,因此显着地延长了MEMS器件的可靠性和使用寿命。