Method for supporting during fabrication mechanical members of semi-conductive dies, wafers, and devices and an associated intermediate device assembly
    2.
    发明授权
    Method for supporting during fabrication mechanical members of semi-conductive dies, wafers, and devices and an associated intermediate device assembly 失效
    在制造半导体模具,晶片和装置的机械构件以及相关联的中间装置组件期间支撑的方法

    公开(公告)号:US06297069B1

    公开(公告)日:2001-10-02

    申请号:US09239469

    申请日:1999-01-28

    IPC分类号: H01L2156

    CPC分类号: B81C1/00896

    摘要: A method is provided for supporting the mechanical members of a micro-electronic substrate during the manufacture of the substrate into a micro-mechanical or micro-electromechanical device. The method provides supporting material that surrounds the various mechanical members of the micro-electronic substrate and stabilizes these mechanical members during manufacture. The method also facilitates precise photolithographic as well as other microfabrication techniques. Specifically, the method provides support material that surrounds the perimeter of the micro-electronic substrate and that has a surface that is coplanar with one surface of the micro-electronic substrate. Photoresist or other materials can then be deposited, such as by spinning, on the surface of the micro-electronic substrate such that the edges of the photoresist or other materials lie upon the supporting material. By placing the outer edges of the photoresist or other material on the surface of the support material, the surface of the micro-electronic substrate remains planar for subsequent photolithographic or other microfabrication procedures. An intermediate micro-electronic device assembly is also provided in which a mechanical member, such as a membrane, is supported by the supporting material.

    摘要翻译: 提供了一种用于在将基板制造成微机电或微机电装置期间将微电子基板的机械构件支撑的方法。 该方法提供围绕微电子基板的各种机械构件的支撑材料,并且在制造期间使这些机械构件稳定。 该方法还有助于精确的光刻以及其他微细加工技术。 具体地,该方法提供围绕微电子基板的周边并且具有与微电子基板的一个表面共面的表面的支撑材料。 然后可以将光致抗蚀剂或其它材料例如通过旋转沉积在微电子基板的表面上,使得光致抗蚀剂或其它材料的边缘位于支撑材料上。 通过将光致抗蚀剂或其他材料的外边缘放置在支撑材料的表面上,微电子基板的表面保持平面以用于随后的光刻或其它微细加工步骤。 还提供了一种中间微电子器件组件,其中诸如膜的机械构件由支撑材料支撑。

    Encapsulated display devices
    3.
    发明授权
    Encapsulated display devices 有权
    封装的显示设备

    公开(公告)号:US06573652B1

    公开(公告)日:2003-06-03

    申请号:US09553187

    申请日:2000-04-20

    IPC分类号: H01L2156

    摘要: An encapsulated display device. The device includes a substrate, an environmentally sensitive display device adjacent to the substrate, and at least one first barrier stack adjacent to the environmentally sensitive display device. The barrier stack encapsulates the environmentally sensitive display device. It includes at least one first barrier layer and at least one first polymer layer. The encapsulated display device optionally includes at least one second barrier stack located between the substrate and the environmentally sensitive display device. The second barrier stack includes at least one second barrier layer and at least one second polymer layer. A method for making an encapsulated display device is also disclosed.

    摘要翻译: 封装的显示设备。 该装置包括基板,与基板相邻的对环境敏感的显示装置以及与环境敏感的显示装置相邻的至少一个第一屏障堆叠。 屏障堆叠封装环境敏感的显示设备。 它包括至少一个第一阻挡层和至少一个第一聚合物层。 封装的显示装置可选地包括位于基板和环境敏感显示装置之间的至少一个第二势垒堆叠。 第二阻挡层包括至少一个第二阻挡层和至少一个第二聚合物层。 还公开了一种制造封装的显示装置的方法。

    Amorphous hydrogenated carbon hermetic structure fabrication method
    7.
    发明授权
    Amorphous hydrogenated carbon hermetic structure fabrication method 失效
    无定形氢化碳密封结构制造方法

    公开(公告)号:US06548329B1

    公开(公告)日:2003-04-15

    申请号:US09561870

    申请日:2000-05-01

    IPC分类号: H01L2156

    摘要: A hard layer of amorphous hydrogenated carbon (DLC) overlies a polymer film structure and a plurality of soft layers of DLC alternate with a plurality of hard layers of DLC over the barrier base to form a corrosion resistant structure. The polymer film structure and a circuit chip can be elements of a circuit module. The DLC and the polymer film structure can have vias extending to contact pads, and a pattern of electrical conductors can extend through the vias to the contact pads. In one embodiment the DLC forms a hermetic (and therefore corrosion resistant) seal over the polymer film structure.

    摘要翻译: 无定形氢化碳(DLC)的硬层覆盖聚合物膜结构,并且DLC的多个软层与阻挡基底上的多个DLC硬层交替以形成耐腐蚀结构。 聚合物膜结构和电路芯片可以是电路模块的元件。 DLC和聚合物膜结构可以具有延伸到接触焊盘的通孔,并且电导体的图案可以延伸穿过通孔到接触焊盘。 在一个实施方案中,DLC在聚合物膜结构上形成密封(因此是耐腐蚀的)密封。

    MEMS device with controlled gas space chemistry
    9.
    发明授权
    MEMS device with controlled gas space chemistry 有权
    具有可控气体空间化学的MEMS器件

    公开(公告)号:US06746886B2

    公开(公告)日:2004-06-08

    申请号:US10101669

    申请日:2002-03-18

    IPC分类号: H01L2156

    摘要: A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.

    摘要翻译: 用于保护在紫外线照射应用中使用的MEMS器件的过程不会由于UV通量和封装气体成分之间的光化学活化而损坏,所述UV通量和封装气体成分由放置在器件封装中的各种润滑剂和钝化剂的排出物形成,以防止粘附 MEMS器件的运动部件。 该方法用金属卤化物膜涂覆MEMS器件和封装的光学窗表面的暴露表面以消除该光化学活化,因此显着地延长了MEMS器件的可靠性和使用寿命。

    Method of producing an integrated circuit and an integrated circuit
    10.
    发明授权
    Method of producing an integrated circuit and an integrated circuit 有权
    集成电路和集成电路的制造方法

    公开(公告)号:US06649450B2

    公开(公告)日:2003-11-18

    申请号:US10022653

    申请日:2001-12-18

    IPC分类号: H01L2156

    摘要: A circuit is described which has a semiconductor component surrounded by a plastic housing and with which contact can be made via conductor tracks. Between each dividing surface of the conductor tracks and an area of the plastic housing surrounding the relevant dividing surface, as viewed in plan view of the dividing surface, a spacing is provided in each case.

    摘要翻译: 描述了一种电路,其具有由塑料外壳包围的半导体部件,并且可以通过导体轨迹与其接触。 在导体轨道的每个分隔表面和围绕相关分隔表面的塑料壳体的区域之间,如在分隔表面的平面图中所示,在每种情况下都设置间隔。