发明授权
- 专利标题: CMOS-compatible metal-semiconductor-metal photodetector
- 专利标题(中): CMOS兼容金属 - 半导体 - 金属光电探测器
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申请号: US09963194申请日: 2001-09-26
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公开(公告)号: US06756651B2公开(公告)日: 2004-06-29
- 发明人: Ferenc M. Bozso , Fenton Read McFeely , John Jacob Yurkas
- 申请人: Ferenc M. Bozso , Fenton Read McFeely , John Jacob Yurkas
- 主分类号: H01L2714
- IPC分类号: H01L2714
摘要:
A novel photodetector CMOS-compatible photodetector is disclosed in which photo-generation of carriers (electrons) is carried out in the metal of the electrodes, rather than as electron-hole pairs in the semiconductor on which the metal electrodes are deposited. The novel photo detector comprises a silicon or other semiconductor substrate material characterized by an electron energy bandgap, and a pair of metal electrodes disposed upon a surface of the silicon to define therebetween a border area of the surface. One of the two electrodes being exposed to the incident radiation and covering an area of said surface which is larger than the aforesaid border area, the aforesaid metal of the electrodes being characterized by a Fermi level which is within said electron energy bandgap.
公开/授权文献
- US20030057507A1 CMOS-compatible metal-semiconductor-metal photodetector 公开/授权日:2003-03-27
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