Invention Grant
US06777645B2 High-speed, precision, laser-based method and system for processing material of one or more targets within a field 有权
高速,精密,基于激光的方法和系统,用于处理场内一个或多个靶材的材料

High-speed, precision, laser-based method and system for processing material of one or more targets within a field
Abstract:
A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.
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