公开(公告)号：US08809734B2

公开(公告)日：2014-08-19

申请号：US13541320

申请日：2012-07-03

申请人： James J. Cordingley ,  Jonathan S. Ehrmann ,  David M. Filgas ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： James J. Cordingley ,  Jonathan S. Ehrmann ,  David M. Filgas ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： H01L21/00 ,  B23K26/067 ,  B23K26/08

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US20120276754A1

公开(公告)日：2012-11-01

申请号：US13541320

申请日：2012-07-03

申请人： James J. Cordingley ,  Jonathan S. Ehrmann ,  David M. Filgas ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： James J. Cordingley ,  Jonathan S. Ehrmann ,  David M. Filgas ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： H01L21/263 ,  B23K26/00

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US08217304B2

公开(公告)日：2012-07-10

申请号：US10107890

申请日：2002-03-27

申请人： James J. Cordingley ,  Jonathan S. Ehrmann ,  David M. Filgas ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： James J. Cordingley ,  Jonathan S. Ehrmann ,  David M. Filgas ,  Shepard D. Johnson ,  Joohan Lee ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： B23K26/08 ,  B23K26/067 ,  H01L21/00

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

摘要翻译： 提供一种用于局部处理形成在基板上的预定微结构而不引起基板或其上形成在基板上的其它结构的电学或物理特性的不期望的变化的方法和系统。 该方法包括基于与预定微结构，衬底和其它结构的激光脉冲相互作用的模型来提供信息。 基于该信息确定至少一个脉冲的至少一个特性。 生成包括至少一个脉冲的脉冲激光束。 该方法还包括将具有至少一个确定特性的至少一个脉冲照射到预定微结构上的点中。 所述至少一个脉冲的至少一个确定的特征和其它特征足以在不引起不期望的变化的情况下局部地处理预定的微结构。

公开(公告)号：US20110210105A1

公开(公告)日：2011-09-01

申请号：US12976539

申请日：2010-12-22

申请人： Dmitry N. Romashko ,  Michael Plotkin ,  Jonathan S. Ehrmann ,  James J. Cordingley ,  Shepard D. Johnson

发明人： Dmitry N. Romashko ,  Michael Plotkin ,  Jonathan S. Ehrmann ,  James J. Cordingley ,  Shepard D. Johnson

IPC分类号： B23K26/00

CPC分类号： H01L23/5258 ,  B23K26/042 ,  B23K26/0732 ,  B23K26/082 ,  H01L21/76892 ,  H01L2924/0002 ,  H01L2924/00

摘要： Link processing systems and methods use controlled two dimensional deflection of a beam along an optical axis trajectory to process links positioned along and transverse to the trajectory during a pass of the optical axis along the trajectory. Predictive position calculations allow link blowing accuracy during constant velocity and accelerating trajectories.

摘要翻译： 链路处理系统和方法使用沿着光轴轨迹的光束的受控二维偏转，以在沿着轨迹的光轴的通过期间处理沿着和横向于轨迹定位的链接。 预测位置计算允许在恒定速度和加速轨迹期间的链接吹风精度。

公开(公告)号：US20110108534A1

公开(公告)日：2011-05-12

申请号：US13004710

申请日：2011-01-11

申请人： Bruce L. Couch ,  Jonathan S. Ehrmann ,  Yun Fee Chu ,  Joseph V. Lento ,  Shepard D. Johnson

发明人： Bruce L. Couch ,  Jonathan S. Ehrmann ,  Yun Fee Chu ,  Joseph V. Lento ,  Shepard D. Johnson

IPC分类号： B23K26/06

CPC分类号： H01L28/20 ,  B23K26/03 ,  B23K26/032 ,  B23K26/034 ,  B23K26/04 ,  B23K26/0622 ,  B23K26/064 ,  B23K26/0665 ,  B23K26/073 ,  B23K26/0736 ,  B23K26/082 ,  B23K26/0823 ,  B23K26/0853 ,  B23K26/351 ,  B23K26/361 ,  B23K26/40 ,  B23K2101/38 ,  B23K2103/50 ,  H01C17/242 ,  H01L27/016

摘要： A method and system for high-speed, precise micromachining an array of devices are disclosed wherein improved process throughput and accuracy, such as resistor trimming accuracy, are provided. Beam scanning and deflection are both used to distribute beam spots to elements of an array of elements for selective processing. The deflection can be performed with a solid state deflector.

摘要翻译： 公开了一种用于高速，精确地微加工器件阵列的方法和系统，其中提供了改进的工艺处理量和精度，例如电阻器修整精度。 光束扫描和偏转都用于将光束斑点分布到用于选择性处理的元件阵列的元件。 偏转可用固态偏转器进行。

公开(公告)号：US07148447B2

公开(公告)日：2006-12-12

申请号：US11332923

申请日：2006-01-16

申请人： Jonathan S. Ehrmann ,  James J. Cordingley ,  Donald V. Smart ,  Donald J. Svetkoff

发明人： Jonathan S. Ehrmann ,  James J. Cordingley ,  Donald V. Smart ,  Donald J. Svetkoff

IPC分类号： B23K26/06 ,  B23K26/38

CPC分类号： B23K26/0736 ,  B23K26/032 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0613 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/0665 ,  B23K26/067 ,  B23K26/082 ,  B23K26/10 ,  B23K26/16 ,  B23K26/361 ,  B23K26/389 ,  B23K26/40 ,  B23K2101/38 ,  B23K2101/40 ,  B23K2103/10 ,  B23K2103/12 ,  B23K2103/172 ,  B23K2103/50 ,  H01L21/485 ,  H01L21/76888 ,  H01L21/76894 ,  H01L22/12 ,  H01L23/5258 ,  H01L2924/0002 ,  H05K3/0026 ,  H01L2924/00

摘要： A precision, laser-based method and system for high-speed, sequential processing of material of targets within a field are disclosed that control the irradiation distribution pattern of imaged spots. For each spot, a laser beam is incident on a first anamorphic optical device and a second anamorphic optical device so that the beam is controllably modified into an elliptical irradiance pattern. The modified beam is propagated through a scanning optical system with an objective lens to image a controlled elliptical spot on the target. In one embodiment, the relative orientations of the devices along an optical axis are controlled to modify the beam irradiance pattern to obtain an elliptical shape while the absolute orientation of the devices controls the orientation of the elliptical spot.

摘要翻译： 公开了一种精确的，基于激光的方法和系统，用于高速，顺序地处理场内目标物质的方法和系统，其控制成像斑点的照射分布模式。 对于每个点，激光束入射在第一变形光学器件和第二变形光学器件上，使得光束被可控地修改为椭圆辐照度图案。 修改的光束通过具有物镜的扫描光学系统传播，以对靶上的受控椭圆点进行成像。 在一个实施例中，控制沿着光轴的装置的相对取向以修改束辐照度图案以获得椭圆形，同时装置的绝对取向控制椭圆点的取向。

公开(公告)号：US07015418B2

公开(公告)日：2006-03-21

申请号：US10438533

申请日：2003-05-15

申请人： Steven P. Cahill ,  Jonathan S. Ehrmann ,  You C. Li ,  Rainer Schramm ,  Kurt Pelsue

发明人： Steven P. Cahill ,  Jonathan S. Ehrmann ,  You C. Li ,  Rainer Schramm ,  Kurt Pelsue

IPC分类号： B23K26/00

CPC分类号： B23K26/04 ,  B23K26/042 ,  B23K26/043 ,  B23K26/0853 ,  B23K26/361 ,  B23K26/40 ,  B23K26/705 ,  B23K2101/007 ,  B23K2101/40 ,  B23K2103/50 ,  G06K1/126 ,  H01C17/242 ,  H01L21/67282 ,  H01L21/681 ,  H01L23/544 ,  H01L2223/5442 ,  H01L2223/54453 ,  H01L2223/54473 ,  H01L2223/5448 ,  H01L2924/0002 ,  H01L2924/00

摘要： A method of calibrating a laser marking system includes calibrating a laser marking system in three dimensions. The step of calibrating includes storing data corresponding to a plurality of heights. A position measurement of a workpiece is obtained to be marked. Stored calibration data is associated with the position measurement. A method and system for calibrating a laser processing or marking system is provided. The method includes: calibrating a laser marker over a marking field; obtaining a position measurement of a workpiece to be marked; associating stored calibration data with the position measurement; relatively positioning a marking beam and the workpiece based on at least the associated calibration data; and calibrating a laser marking system in at least three degrees of freedom. The step of calibrating includes storing data corresponding to a plurality of positions and controllably and relatively positioning a marking beam based on the stored data corresponding to the plurality of positions.

公开(公告)号：US06573473B2

公开(公告)日：2003-06-03

申请号：US10001104

申请日：2001-11-02

申请人： Bradley L. Hunter ,  Steven P. Cahill ,  Jonathan S. Ehrmann ,  Michael Plotkin

发明人： Bradley L. Hunter ,  Steven P. Cahill ,  Jonathan S. Ehrmann ,  Michael Plotkin

IPC分类号： B23K2602

CPC分类号： B23K26/046 ,  B23K26/02 ,  B23K26/04 ,  B23K26/043 ,  B23K26/0853 ,  B23K2101/40 ,  G03F7/70041 ,  G03F7/70725

摘要： A high-speed method and system for precisely positioning a waist of a material-processing laser beam to dynamically compensate for local variations in height of microstructures located on a plurality of objects spaced apart within a laser-processing site are provided. In the preferred embodiment, the microstructures are a plurality of conductive lines formed on a plurality of memory dice of a semiconductor wafer. The system includes a focusing lens subsystem for focusing a laser beam along an optical axis substantially orthogonal to a plane, an x-y stage for moving the wafer in the plane, and a first air bearing sled for moving the focusing lens subsystem along the optical axis.

摘要翻译： 提供了一种用于精确定位材料处理激光束的腰部以动态地补偿位于激光加工部位内间隔开的多个物体上的微结构的局部高度变化的高速方法和系统。 在优选实施例中，微结构是形成在半导体晶片的多个存储芯片上的多个导线。 该系统包括聚焦透镜子系统，用于沿着基本上垂直于平面的光轴聚焦激光束，用于在平面中移动晶片的x-y级，以及用于沿着光轴移动聚焦透镜子系统的第一空气轴承滑座。

公开(公告)号：US06496292B2

公开(公告)日：2002-12-17

申请号：US10007269

申请日：2001-10-22

申请人： Timothy Fillion ,  Arkady Savikovsky ,  Jonathan S. Ehrmann

发明人： Timothy Fillion ,  Arkady Savikovsky ,  Jonathan S. Ehrmann

IPC分类号： G02B2608

CPC分类号： G03F7/70058 ,  G02B26/105 ,  G03F7/70375

摘要： In an optical-radiation patterning apparatus, a scan mirror (29) so deflects laser light from a source (32) as to draw a pattern on a substrate (26). A focusing system (42) forms a light spot on the substrate that is significantly narrower than the line to be drawn, and it thereby minimizes the sensitivity of the line-edge position to variations in light-spot size. To achieve the intended line width, an acousto-optical device (32) introduces dither in the direction orthogonal to the light-spot motion that the scan mirror (30) causes. The focusing system (42) shapes the spot so that it is wider in the scan direction than it is in the dither direction, and this permits a relatively high scan rate for a given dither frequency.

公开(公告)号：US06181425B2

公开(公告)日：2001-01-30

申请号：US09419586

申请日：1999-10-18

申请人： Donald J. Svetkoff ,  Donald B. T. Kilgus ,  Warren Lin ,  Jonathan S. Ehrmann

发明人： Donald J. Svetkoff ,  Donald B. T. Kilgus ,  Warren Lin ,  Jonathan S. Ehrmann

IPC分类号： G01B1124

CPC分类号： G01B11/2545 ,  G01B11/026 ,  G01B11/24 ,  G01B11/2518 ,  G01N21/9501 ,  G02B21/22

摘要： A system including confocal and triangulation-based scanners or subsystems provides data which is both acquired and processed under the control of a control algorithm to obtain information such as dimensional information about microscopic targets which may be “non-cooperative.” The “non-cooperative” targets are illuminated with a scanning beam of electromagnetic radiation such as laser light incident from a first direction. A confocal detector of the electromagnetic radiation is placed at a first location for receiving reflected radiation which is substantially optically collinear with the incident beam of electromagnetic radiation. The system includes a spatial filter for attenuating background energy. The triangulation-based subsystem also includes a detector of electromagnetic radiation which is placed at a second location which is non-collinear with respect to the incident beam. This detector has a position sensitive axis. Digital data is derived from signals produced by the detectors. In this way, data from at least one triangulation-based channel is acquired in parallel or sequentially with at least one slice of confocal image data having substantially perfect temporal and spatial registration with the triangulation-based sensor data. This allows for fusion or further processing of the data for use with a predetermined measurement algorithm to thereby obtain information about the targets.

摘要翻译： 包括基于共焦和三角测量的扫描仪或子系统的系统提供在控制算法的控制下获取和处理的数据，以获得关于可能是“非合作”的微观目标的尺寸信息。 “非协同”目标用诸如从第一方向入射的激光的电磁辐射扫描束照射。 电磁辐射的共焦检测器被放置在第一位置，用于接收与入射的电磁辐射束基本上光学共线的反射辐射。 该系统包括用于衰减背景能量的空间滤波器。 基于三角测量的子系统还包括电磁辐射检测器，其被放置在相对于入射光束非共线的第二位置。 该检测器具有位置敏感轴。 数字数据源自由检测器产生的信号。 以这种方式，来自至少一个基于三角测量的信道的数据被并行或顺序地与具有基于三角测量的传感器数据具有基本上完美的时间和空间配准的共焦图像数据的至少一个切片获取。 这允许融合或进一步处理与预定测量算法一起使用的数据，从而获得关于目标的信息。