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    Optical metrological scale and laser-based manufacturing method therefor
    3.
    发明授权
    Optical metrological scale and laser-based manufacturing method therefor 有权
    光学计量尺度和激光制造方法

    公开(公告)号：US07903336B2

    公开(公告)日：2011-03-08

    申请号：US11546024

    申请日：2006-10-11

    申请人： Kurt Pelsue ,  Stuart A. Dodson, II ,  Bradley L. Hunter ,  Donald V. Smart ,  Pierre-Yves Mabboux ,  Jonathan S. Ehrmann

    发明人： Kurt Pelsue ,  Stuart A. Dodson, II ,  Bradley L. Hunter ,  Donald V. Smart ,  Pierre-Yves Mabboux ,  Jonathan S. Ehrmann

    IPC分类号： G02B27/44 ,  G02F1/295 ,  H03M1/22 ,  G01B11/02

    CPC分类号： B41M5/24 ,  B23K26/364 ,  G01D5/34707

    摘要： A reflective metrological scale has a metal tape substrate and a scale pattern of elongated side-by-side marks surrounded by reflective surface areas of the substrate. Each mark has a furrowed cross section and may have a depth in the range of 0.5 to 2 microns. The central region of each mark may be rippled and darkened to provide an enhanced optical reflection ratio with respect to surrounding surface areas. A manufacturing method includes the repeated steps of (1) creating a scale mark by irradiating the substrate surface at a mark location with overlapped pulses from a laser, each pulse having an energy density of less than about 1 joule per cm2, and (2) changing the relative position of the laser and the substrate by a displacement amount defining a next mark location on the substrate at which a next mark of the scale is to be created.

    摘要翻译： 反射计量标尺具有金属带基板和由基板的反射表面区域包围的细长的并排标记的刻度图案。 每个标记具有沟槽的横截面并且可以具有在0.5至2微米范围内的深度。 每个标记的中心区域可能波纹和变暗，以提供相对于周围表面区域的增强的光反射率。 一种制造方法包括以下重复步骤：（1）通过在来自激光器的重叠脉冲的标记位置处照射基板表面来产生刻度标记，每个脉冲具有小于约1焦耳/ cm 2的能量密度，以及（2） 改变激光器和衬底的相对位置一个位移量，该位移量限定了要在其上产生刻度的下一个标记的衬底上的下一个标记位置。

    Laser processing
    6.
    发明授权
    Laser processing 有权

    公开(公告)号：US06878899B2

    公开(公告)日：2005-04-12

    申请号：US10899133

    申请日：2004-07-27

    申请人： Donald V. Smart

    发明人： Donald V. Smart

    IPC分类号： H01L21/768 ,  B23K26/36

    CPC分类号： H01L21/76894 ,  B23K26/0622 ,  B23K26/082 ,  B23K26/0853 ,  B23K26/361 ,  B23K26/40 ,  B23K2101/40 ,  B23K2103/42 ,  B23K2103/50

    摘要： A controlled, switched laser system for vaporizing a target structure on a substrate includes a diode-pumped, solid-state laser for producing a laser output, a controllable switch for controlling the on/off state and power level of the laser, and a wavelength shifter. The wavelength shifter shifts the wavelength of the laser output from a conventional wavelength to a wavelength beyond the absorption edge of the substrate but shorter than 1.2 μm in order to obtain a decrease in absorption of the laser output by the substrate due to the shift in the wavelength of the laser output. The wavelength shifter is removably insertable into the switched laser system so as to enable the switched laser system to operate at the conventional wavelength and at the wavelength beyond the absorption edge of the substrate. Heating of the substrate and hence damage to the substrate is limited due to the wavelength being beyond the absorption edge of the substrate. Good depth of focus of the laser beam output is maintained relative to spot size of the laser beam output due to the wavelength being less than about 1.2 μm.

    Energy-efficient, laser-based method and system for processing target material
    8.
    发明授权
    Energy-efficient, laser-based method and system for processing target material 有权
    节能，基于激光的方法和处理目标材料的系统

    公开(公告)号：US06281471B1

    公开(公告)日：2001-08-28

    申请号：US09473926

    申请日：1999-12-28

    申请人： Donald V. Smart

    发明人： Donald V. Smart

    IPC分类号： B23K2600

    CPC分类号： B23K26/0736 ,  B23K26/0622 ,  B23K26/0624 ,  B23K26/361 ,  B23K26/40 ,  B23K2103/50 ,  H01L21/76894 ,  H01L23/5258 ,  H01L2924/0002 ,  Y10S438/94 ,  Y10T29/49156 ,  H01L2924/00

    摘要： An energy-efficient method and system for processing target material such as microstructures in a microscopic region without causing undesirable changes in electrical and/or physical characteristics of material surrounding the target material is provided. The system includes a controller for generating a processing control signal and a signal generator for generating a modulated drive waveform based on the processing control signal. The waveform has a sub-nanosecond rise time. The system also includes a gain-switched, pulsed semiconductor seed laser for generating a laser pulse train at a repetition rate. The drive waveform pumps the laser so that each pulse of the pulse train has a predetermined shape. Further, the system includes a laser amplifier for optically amplifying the pulse train to obtain an amplified pulse train without significantly changing the predetermined shape of the pulses. The amplified pulses have little distortion and have substantially the same relative temporal power distribution as the original pulse train from the laser. Each of the amplified pulses has a substantially square temporal power density distribution, a sharp rise time, a pulse duration and a fall time. The system further includes a beam delivery and focusing subsystem for delivering and focusing at least a portion of the amplified pulse train onto the target material. The rise time (less than about 1 ns) is fast enough to efficiently couple laser energy to the target material, the pulse duration (typically 2-10 ns) is sufficient to process the target material, and the fall time (a few ns) is rapid enough to prevent the undesirable changes to the material surrounding the target material.

    摘要翻译： 提供了一种用于在微观区域中处理诸如微结构的目标材料而不引起围绕目标材料的材料的电气和/或物理特性的不期望的变化的能量效率方法和系统。 该系统包括用于产生处理控制信号的控制器和用于基于处理控制信号产生调制的驱动波形的信号发生器。 波形具有亚纳秒上升时间。 该系统还包括用于以重复率产生激光脉冲串的增益切换脉冲半导体种子激光器。 驱动波形泵浦激光器，使得脉冲串的每个脉冲具有预定的形状。 此外，该系统包括用于光学放大脉冲串以获得放大的脉冲串而不显着改变脉冲的预定形状的激光放大器。 放大的脉冲具有很小的失真，并且具有与来自激光器的原始脉冲串相当的相对时间功率分布。 每个放大的脉冲具有基本上正方形的时间功率密度分布，急剧上升时间，脉冲持续时间和下降时间。 该系统还包括用于将放大的脉冲序列的至少一部分传送和聚焦到目标材料上的束传递和聚焦子系统。 上升时间（小于约1ns）足够快以有效地将激光能量耦合到目标材料，脉冲持续时间（通常为2-10ns）足以处理目标材料，并且下降时间（几ns） 足够快以防止对目标材料周围的材料的不期望的变化。