发明授权
US06787906B1 Bit line pad and borderless contact on bit line stud with localized etch stop layer formed in an undermined region
有权
位线焊盘和位线触头上的无边界触点，其形成在破坏区域中的局部蚀刻停止层
- 专利标题： Bit line pad and borderless contact on bit line stud with localized etch stop layer formed in an undermined region
- 专利标题（中）： 位线焊盘和位线触头上的无边界触点，其形成在破坏区域中的局部蚀刻停止层
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申请号： US09699589申请日： 2000-10-30
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公开(公告)号： US06787906B1公开(公告)日： 2004-09-07
- 发明人: Won-Suk Yang , Sang-Ho Song , Hong-Sik Jeong , Ki-Nam Kim
- 申请人： Won-Suk Yang , Sang-Ho Song , Hong-Sik Jeong , Ki-Nam Kim
- 主分类号： H01L2348
- IPC分类号： H01L2348
摘要：
An etch-stop layer is selectively provided between layers of a multiple-layered circuit in a selective manner so as to allow for outgassing of impurities during subsequent fabrication processes. The etch-stop layer is formed over an underlying stud so as to serve as an alignment target during formation of an overlying stud formed in an upper layer. In this manner multiple-layered circuits, for example memory devices, can be fabricated in relatively dense configurations.