发明授权
- 专利标题： Josephson device and fabrication process thereof
- 专利标题（中）： 约瑟夫逊装置及其制造工艺
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申请号： US10391412申请日： 2003-03-18
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公开(公告)号： US06790675B2公开(公告)日： 2004-09-14
- 发明人: Seiji Adachi , Hironori Wakana , Yoshihiro Ishimaru , Masahiro Horibe , Osami Horibe , Yoshinobu Tarutani , Keiichi Tanabe
- 申请人： Seiji Adachi , Hironori Wakana , Yoshihiro Ishimaru , Masahiro Horibe , Osami Horibe , Yoshinobu Tarutani , Keiichi Tanabe
- 优先权： JP2002-086896 20020326
- 主分类号： H01L2100
- IPC分类号： H01L2100
摘要：
A method of fabricating a Josephson device includes the steps of forming a first superconducting layer and forming a second superconducting layer to form a Josephson junction therebetween, wherein the step of forming the second superconducting layer includes the steps of conducting a first step of forming the second superconducting layer with improved uniformity and conducting a second step of forming the second superconducting layer on the second superconducting layer formed in the first step with improved film quality.
公开/授权文献
- US20030186467A1 Josephson device and fabrication process thereof 公开/授权日：2003-10-02
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