发明授权
- 专利标题: Method and apparatus for thin film thickness mapping
- 专利标题(中): 用于薄膜厚度测绘的方法和装置
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申请号: US10225534申请日: 2002-08-21
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公开(公告)号: US06792075B2公开(公告)日: 2004-09-14
- 发明人: Krzysztof J. Kozaczek , David S. Kurtz , Paul R. Moran , Roger I. Martin , Patrick W. Dehaven , Kenneth P. Rodbell , Sandra G. Malhotra
- 申请人: Krzysztof J. Kozaczek , David S. Kurtz , Paul R. Moran , Roger I. Martin , Patrick W. Dehaven , Kenneth P. Rodbell , Sandra G. Malhotra
- 主分类号: G01N2320
- IPC分类号: G01N2320
摘要:
An apparatus and method for mapping film thickness of one or more textured polycrystalline thin films. Multiple sample films of known thickness are provided. Each sample film is irradiated by x-ray at a measurement point to generate a diffraction image that captures a plurality of diffraction arcs. Texture information (i.e., pole densities) of the sample film, is calculated based on incomplete pole figures collected on the diffraction image and used to correct the x-ray diffraction intensities from such sample. The corrected diffraction intensities are integrated for each sample film, and then used for constructing a calibration curve that correlates diffraction intensities with respective known film thickness of the sample films. The film thickness of a textured polycrystalline thin film of unknown thickness can therefore be mapped on such calibration curve, using a corrected and integrated diffraction intensity obtained for such thin film of unknown thickness.
公开/授权文献
- US20040047447A1 METHOD AND APPARATUS FOR THIN FILM THICKNESS MAPPING 公开/授权日:2004-03-11
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