Invention Grant
- Patent Title: Method and apparatus for thin film thickness mapping
- Patent Title (中): 用于薄膜厚度测绘的方法和装置
-
Application No.: US10225534Application Date: 2002-08-21
-
Publication No.: US06792075B2Publication Date: 2004-09-14
- Inventor: Krzysztof J. Kozaczek , David S. Kurtz , Paul R. Moran , Roger I. Martin , Patrick W. Dehaven , Kenneth P. Rodbell , Sandra G. Malhotra
- Applicant: Krzysztof J. Kozaczek , David S. Kurtz , Paul R. Moran , Roger I. Martin , Patrick W. Dehaven , Kenneth P. Rodbell , Sandra G. Malhotra
- Main IPC: G01N2320
- IPC: G01N2320

Abstract:
An apparatus and method for mapping film thickness of one or more textured polycrystalline thin films. Multiple sample films of known thickness are provided. Each sample film is irradiated by x-ray at a measurement point to generate a diffraction image that captures a plurality of diffraction arcs. Texture information (i.e., pole densities) of the sample film, is calculated based on incomplete pole figures collected on the diffraction image and used to correct the x-ray diffraction intensities from such sample. The corrected diffraction intensities are integrated for each sample film, and then used for constructing a calibration curve that correlates diffraction intensities with respective known film thickness of the sample films. The film thickness of a textured polycrystalline thin film of unknown thickness can therefore be mapped on such calibration curve, using a corrected and integrated diffraction intensity obtained for such thin film of unknown thickness.
Public/Granted literature
- US20040047447A1 METHOD AND APPARATUS FOR THIN FILM THICKNESS MAPPING Public/Granted day:2004-03-11
Information query