Invention Grant
- Patent Title: Gas discharge laser with improved beam path
- Patent Title (中): 气体放电激光器具有改进的光束路径
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Application No.: US10000991Application Date: 2001-11-14
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Publication No.: US06795474B2Publication Date: 2004-09-21
- Inventor: William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
- Applicant: William N. Partlo , Richard L. Sandstrom , Holzer K. Glatzel , Raymond F. Cybulski , Peter C. Newman , James K. Howey , William G. Hulburd , John T. Melchior , Alex P. Ivaschenko
- Main IPC: H01S322
- IPC: H01S322

Abstract:
An excimer laser with a purged beam path capable of producing a high quality pulsed laser beam at pulse rates in excess of 2,000 Hz at pulse energies of about 5 mJ or greater. The entire purged beam path through the laser system is sealed to minimize contamination of the beam path. A preferred embodiment comprises a thermally decoupled LNP aperture element to minimize thermal distortions in the LNP. This preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter is provided with a special purge of a compartment exposed to the output laser beam.
Public/Granted literature
- US20020105994A1 Gas discharge laser with improved beam path Public/Granted day:2002-08-08
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