发明授权
- 专利标题： Laser oscillating apparatus, exposure apparatus, and device fabrication method
- 专利标题（中）： 激光振荡装置，曝光装置和装置制造方法
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申请号： US09531958申请日： 2000-03-21
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公开(公告)号： US06801554B1公开(公告)日： 2004-10-05
- 发明人: Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
- 申请人： Tadahiro Ohmi , Nobumasa Suzuki , Hiroshi Ohsawa , Nobuyoshi Tanaka , Toshikuni Shinohara , Masaki Hirayama
- 优先权： JP11-084675 19990326
- 主分类号： H01S300
- IPC分类号： H01S300
摘要：
An excimer laser gas in a laser tube 2 is excited by a microwave introduced from awaveguide 1, and electric field concentration occurs in a slit-shaped gap 3 provided in a plate member 11c, causing plasma discharge. Then the phase of plasma light is regulated and the light is resonated, to cause excimer laser light. This construction realizes plasma excitation entirely uniform along a lengthwise direction of laser light emission, and enables uniform laser light emission with minimum energy loss.
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