发明授权
- 专利标题: Method for producing and/or renewing an etching mask
- 专利标题(中): 用于制造和/或更新蚀刻掩模的方法
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申请号: US10167785申请日: 2002-06-12
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公开(公告)号: US06806037B2公开(公告)日: 2004-10-19
- 发明人: Matthias Goldbach , Thomas Hecht , Bernhard Sell
- 申请人: Matthias Goldbach , Thomas Hecht , Bernhard Sell
- 优先权: DE10128481 20010612
- 主分类号: G03F726
- IPC分类号: G03F726
摘要:
An etching mask is produced for etching a substrate by a photoresist layer being exposed such that areas which are exposed once are not yet completely exposed and, on the basis of a reflective layer which is located under the photoresist layer, additionally exposed areas are exposed completely. In consequence, a first etching mask which is used for etching a substrate can be renewed by a second etching mask in that a photoresist layer which is applied to the first etching mask or instead of the first etching mask is exposed such that areas which have been exposed once are not yet completely exposed, and areas which have been additionally exposed on the basis of a reflective layer which is located under the photoresist layer and corresponds to the first etching mask are exposed completely.
公开/授权文献
- US20020185468A1 Method for producing and/or renewing an etching mask 公开/授权日:2002-12-12