发明授权
US06818487B2 Self-aligned, planarized thin-film transistors, devices employing the same, and methods of fabrication thereof 失效
自对准的平面化薄膜晶体管,采用该晶体管的器件及其制造方法

Self-aligned, planarized thin-film transistors, devices employing the same, and methods of fabrication thereof
摘要:
A semiconductor device is presented which includes a self-aligned, planarized thin-film transistor which can be used in various integrated circuit devices, such as static random access memory (SRAM) cells. The semiconductor device has a first field-effect transistor and a second field-effect transistor. The second field-effect transistor overlies the first field-effect transistor, and the first field-effect transistor and the second field-effect transistor share a common gate. The second field-effect transistor includes a source and a drain which are self-aligned to the shared gate in a layer of planarized semiconductor material above the first field-effect transistor. In one embodiment, the second field-effect transistor is a thin-film transistor, and the shared gate has a U-shape wrap-around configuration at a body of the thin-film transistor.
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