发明授权
- 专利标题： Method and apparatus for treating surface of substrate plate
- 专利标题（中）： 用于处理基板表面的方法和装置
-
申请号： US09988559申请日： 2001-11-20
-
公开(公告)号： US06821906B2公开(公告)日： 2004-11-23
- 发明人: Kenya Wada , Kazuto Kinoshita , Kazuhiko Gommori
- 申请人： Kenya Wada , Kazuto Kinoshita , Kazuhiko Gommori
- 优先权： JP2001-182679 20010618
- 主分类号： H01L2100
- IPC分类号： H01L2100
摘要：
Method and apparatus for treating a surface of a substrate plate under irradiation of ultraviolet ray emitted from a dielectric barrier discharge lamp. Upon admission into a treating chamber, oxygen is removed from a treating surface and surrounding atmosphere of a substrate plate in order to suppress energy losses of ultraviolet ray to a minimum.
公开/授权文献
信息查询
