发明授权
US06824957B2 Resin useful for resist, resist composition and pattern forming process using the same
有权
可用于抗蚀剂，抗蚀剂组合物和使用其的图案形成方法的树脂
- 专利标题： Resin useful for resist, resist composition and pattern forming process using the same
- 专利标题（中）： 可用于抗蚀剂，抗蚀剂组合物和使用其的图案形成方法的树脂
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申请号： US10635571申请日： 2003-08-07
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公开(公告)号： US06824957B2公开(公告)日： 2004-11-30
- 发明人: Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
- 申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
- 优先权： JP10-269320 19980924; JP11-70591 19990316
- 主分类号： G03F720
- IPC分类号： G03F720
摘要：
According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
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