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公开(公告)号：US20050037284A1
公开(公告)日：2005-02-17
申请号：US10937357
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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公开(公告)号：US07029823B2
公开(公告)日：2006-04-18
申请号：US10937357
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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3.发明授权Resin useful for resist, resist composition and pattern forming process using the same 有权可用于抗蚀剂，抗蚀剂组合物和使用其的图案形成方法的树脂公开(公告)号：US06824957B2
公开(公告)日：2004-11-30
申请号：US10635571
申请日：2003-08-07
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F720
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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公开(公告)号：US07119156B2
公开(公告)日：2006-10-10
申请号：US10937313
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F7/04
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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公开(公告)号：US20050031991A1
公开(公告)日：2005-02-10
申请号：US10937853
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。
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公开(公告)号：US20050031990A1
公开(公告)日：2005-02-10
申请号：US10937577
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性均优异的抗蚀剂图案。
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7.发明授权Resin useful for resist, resist composition and pattern forming process using the same 有权可用于抗蚀剂，抗蚀剂组合物和使用其的图案形成方法的树脂公开(公告)号：US06303266B1
公开(公告)日：2001-10-16
申请号：US09401181
申请日：1999-09-23
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
IPC分类号： G03F7004
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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公开(公告)号：US07070905B2
公开(公告)日：2006-07-04
申请号：US10937577
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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公开(公告)号：US07063932B2
公开(公告)日：2006-06-20
申请号：US10937832
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
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公开(公告)号：US20050037283A1
公开(公告)日：2005-02-17
申请号：US10937313
申请日：2004-09-10
申请人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
发明人： Takeshi Okino , Koji Asakawa , Naomi Shida , Toru Ushirogouchi , Satoshi Saito
CPC分类号： G03F7/0382 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： According to the present invention, a resist resin having in its structure a specific bridged-bond-containing aliphatic ring, and a resist composition comprising the same are provided. By using this resist composition, a resist pattern excellent in both transparency against short-wavelength light and dry-etching resistance can be formed by alkali development with high resolution.
摘要翻译： 根据本发明，提供了具有特定含桥连键的脂肪族环的结构的抗蚀剂树脂和包含该抗蚀剂树脂的抗蚀剂组合物。 通过使用该抗蚀剂组合物，可以通过高分辨率的碱显影形成对短波长光的透明性和耐干蚀刻性优异的抗蚀剂图案。
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