Invention Grant
US06833027B2 Method of manufacturing high voltage schottky diamond diodes with low boron doping
失效
制造具有低硼掺杂的高电压肖特基金刚石二极管的方法
- Patent Title: Method of manufacturing high voltage schottky diamond diodes with low boron doping
- Patent Title (中): 制造具有低硼掺杂的高电压肖特基金刚石二极管的方法
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Application No.: US10254809Application Date: 2002-09-26
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Publication No.: US06833027B2Publication Date: 2004-12-21
- Inventor: James E. Butler , Michael W. Geis , Donald D. Flechtner , Robert L. Wright
- Applicant: James E. Butler , Michael W. Geis , Donald D. Flechtner , Robert L. Wright
- Main IPC: C30B2904
- IPC: C30B2904

Abstract:
A method of making a Schottky diode comprising the steps of: providing a single crystal diamond comprising a surface; placing the single crystal diamond in a CVD system; heating the diamond to a temperature of at least about 950° C.; providing a gas mixture capable of growing diamond film and comprising a sulfur compound through the CVD system; growing an epitaxial diamond film on the surface of the single crystal diamond; baking the diamond at a temperature of at least about 650° C. in air for a period of time that minimizes oxidation of the diamond; and fabricating a Schottky diode comprising the diamond film. A Schottky diode comprising an epitaxial diamond film and capable of blocking at least about 6 kV in a distance of no more than about 300 &mgr;m.
Public/Granted literature
- US20030075100A1 Method of manufacturing high voltage schottky diamond diodes with low boron doping Public/Granted day:2003-04-24
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