- 专利标题: Warpage preventing substrate
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申请号: US10309564申请日: 2002-12-04
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公开(公告)号: US06835897B2公开(公告)日: 2004-12-28
- 发明人: Chin-Huang Chang , Chin-Tien Chiu , Cheng-Lun Liu
- 申请人: Chin-Huang Chang , Chin-Tien Chiu , Cheng-Lun Liu
- 优先权: TW91123174A 20021008
- 主分类号: H05K103
- IPC分类号: H05K103
摘要:
A warpage preventing substrate is provided. A plurality of first and second conductive traces are respectively formed on a first surface and a second surface of a core layer of the substrate, each conductive trace having a terminal, and a plurality of first and second non-functional traces are respectively formed on the first and second surfaces of the core layer at area free of the conductive traces. The first non-functional traces are arranged in different density from the second non-functional traces in a manner that, stress generated from the first conductive traces and first non-functional traces counteracts stress generated from the second conductive traces and second non-functional traces, to thereby prevent warpage of the substrate and maintain flatness of the substrate.
公开/授权文献
- US20040065473A1 Warpage preventing substrate 公开/授权日:2004-04-08
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