发明授权
- 专利标题: Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
- 专利标题(中): 分析同时进行多重入射角测量的隔离和非周期结构
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申请号: US10850491申请日: 2004-05-20
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公开(公告)号: US06842259B2公开(公告)日: 2005-01-11
- 发明人: Allan Rosencwaig , Jon Opsal
- 申请人: Allan Rosencwaig , Jon Opsal
- 申请人地址: US CA Fremont
- 专利权人: Therma-Wave, Inc.
- 当前专利权人: Therma-Wave, Inc.
- 当前专利权人地址: US CA Fremont
- 代理机构: Stallman & Pollock LLP
- 主分类号: G01B11/00
- IPC分类号: G01B11/00 ; G01B11/02 ; G01B11/06 ; G01B11/24
摘要:
A method is disclosed for evaluating isolated and aperiodic structure on a semiconductor sample. A probe beam from a coherent laser source is focused onto the structure in a manner to create a spread of angles incidence. The reflected light is monitored with an array detector. The intensity or polarization state of the reflected beam as a function of radial position within the beam is measured. Each measurement includes both specularly reflected light as well as light that has been scattered from the aperiodic structure into that detection position. The resulting output is evaluated using an aperiodic analysis to determine the geometry of the structure.
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