发明授权
US06842259B2 Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements 有权
分析同时进行多重入射角测量的隔离和非周期结构

Analysis of isolated and aperiodic structures with simultaneous multiple angle of incidence measurements
摘要:
A method is disclosed for evaluating isolated and aperiodic structure on a semiconductor sample. A probe beam from a coherent laser source is focused onto the structure in a manner to create a spread of angles incidence. The reflected light is monitored with an array detector. The intensity or polarization state of the reflected beam as a function of radial position within the beam is measured. Each measurement includes both specularly reflected light as well as light that has been scattered from the aperiodic structure into that detection position. The resulting output is evaluated using an aperiodic analysis to determine the geometry of the structure.
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