Invention Grant
- Patent Title: Method for characterizing the performance of an electrostatic chuck
- Patent Title (中): 表征静电卡盘性能的方法
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Application No.: US09924038Application Date: 2001-08-07
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Publication No.: US06853953B2Publication Date: 2005-02-08
- Inventor: Jozef Brcka , Bill Jones , Gert Leusink , Jeffrey J. Long , Bill Oliver , Charles Tweed
- Applicant: Jozef Brcka , Bill Jones , Gert Leusink , Jeffrey J. Long , Bill Oliver , Charles Tweed
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, L.L.P.
- Main IPC: C23C14/50
- IPC: C23C14/50 ; C23C16/44 ; H01L21/00 ; H01L21/3065 ; H01L21/683 ; G06F11/30
Abstract:
A method for characterizing the performance of an electrostatic chuck prior to installing the chuck in the vacuum chamber of a semiconductor processing system in a production line. One or more characteristics of the electrostatic chuck are measured and compared with the known characteristics of a reference chuck. The comparison indicates the performance of the chuck and projects the performance of the chuck in an actual operating environment. The characteristics that are measured include the chuck impedance, the current-voltage characteristic of the chuck, the local plasma density proximate the support surface of the chuck, and the cooling or heating rate of the chuck.
Public/Granted literature
- US20030033116A1 Method for characterizing the performance of an electrostatic chuck Public/Granted day:2003-02-13
Information query
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