发明授权
US06854484B2 Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve
有权
用于化学机械抛光装置的浆料出口开口的阀和具有阀的化学机械抛光装置
- 专利标题： Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve
- 专利标题（中）： 用于化学机械抛光装置的浆料出口开口的阀和具有阀的化学机械抛光装置
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申请号： US10210014申请日： 2002-07-31
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公开(公告)号： US06854484B2公开(公告)日： 2005-02-15
- 发明人: Stefan Geyer , Andreas Fischer
- 申请人： Stefan Geyer , Andreas Fischer
- 申请人地址： DE Munich
- 专利权人： Infineon Technologies AG
- 当前专利权人： Infineon Technologies AG
- 当前专利权人地址： DE Munich
- 代理商 Laurence A. Greenberg; Werner H. Stemer; Ralph E. Locher
- 优先权： DE10137577 20010731
- 主分类号： B24B37/04
- IPC分类号： B24B37/04 ; B24B57/02 ; H01L21/304 ; F16K15/14
摘要：
A valve for a slurry outlet opening in an installation for chemical mechanical polishing, in particular of semiconductor wafers in DRAM production, includes an elastic diaphragm, which covers the slurry outlet opening and has at least one self-closing opening. It is possible for the opening to be moved into a feedthrough position for the slurry by flowing slurry and to be automatically moved into a blocking position for the slurry when the slurry is not flowing. A CMP installation having such a valve is also provided. This creates a simple way of preventing particle agglomerations in the region of the fluid outlet opening of a CMP installation.
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