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    Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve
    1.
    发明授权
    Valve for a slurry outlet opening of a chemical mechanical polishing device and chemical mechanical polishing device having a valve 有权
    用于化学机械抛光装置的浆料出口开口的阀和具有阀的化学机械抛光装置

    公开(公告)号：US06854484B2

    公开(公告)日：2005-02-15

    申请号：US10210014

    申请日：2002-07-31

    申请人： Stefan Geyer ,  Andreas Fischer

    发明人： Stefan Geyer ,  Andreas Fischer

    IPC分类号： B24B37/04 ,  B24B57/02 ,  H01L21/304 ,  F16K15/14

    CPC分类号： B24B37/04 ,  B24B57/02 ,  Y10T137/788 ,  Y10T137/7885

    摘要： A valve for a slurry outlet opening in an installation for chemical mechanical polishing, in particular of semiconductor wafers in DRAM production, includes an elastic diaphragm, which covers the slurry outlet opening and has at least one self-closing opening. It is possible for the opening to be moved into a feedthrough position for the slurry by flowing slurry and to be automatically moved into a blocking position for the slurry when the slurry is not flowing. A CMP installation having such a valve is also provided. This creates a simple way of preventing particle agglomerations in the region of the fluid outlet opening of a CMP installation.

    摘要翻译： 用于化学机械抛光的装置中的浆料出口开口的阀，特别是DRAM生产中的半导体晶片的阀包括一个弹性隔膜，其覆盖浆料出口开口并且具有至少一个自闭合开口。 通过流动浆料将开口移动到浆料的馈通位置，并且当浆料不流动时自动移动到浆料的阻挡位置。 还提供了具有这种阀的CMP装置。 这创建了一种在CMP装置的流体出口的区域中防止颗粒聚集的简单方法。

    Pressure vessel arrangement comprising an external pressure vessel and at least one insert basket
    2.
    发明授权
    Pressure vessel arrangement comprising an external pressure vessel and at least one insert basket 有权
    压力容器装置包括外部压力容器和至少一个插入篮

    公开(公告)号：US08557185B2

    公开(公告)日：2013-10-15

    申请号：US12545254

    申请日：2009-08-21

    申请人： Josef Schulmeyr ,  Stefan Geyer ,  Manfred Gehrig

    发明人： Josef Schulmeyr ,  Stefan Geyer ,  Manfred Gehrig

    IPC分类号： B01J3/04

    CPC分类号： F16J12/00 ,  B01D11/0203 ,  B01D11/0288 ,  C12C3/10

    摘要： A pressure vessel arrangement comprises an external pressure vessel and at least one insert basket in the pressure vessel for receiving a substance to be treated which is exposable to a pressure fluid which is feedable to the pressure vessel and the insert basket. There is provided a control device for the internal pressure prevailing in the insert basket, in particular in the form of a switchable pressure compensation line connecting the interior of the insert basket directly to the surroundings, i.e. not via the pressure vessel.

    摘要翻译： 压力容器装置包括外部压力容器和压力容器中的至少一个插入篮，用于接收可暴露于压力容器的待处理物质，该压力流体可供给压力容器和插入篮。 提供了一种用于插入篮中的内部压力的控制装置，特别是以可切换的压力补偿线的形式，将插入篮的内部直接连接到周围环境，即不通过压力容器。

    Solution of tetramethylammonium hydroxide in water and a process for preparing the solution
    4.
    发明授权
    Solution of tetramethylammonium hydroxide in water and a process for preparing the solution 有权
    四甲基氢氧化铵在水中的溶液和制备溶液的方法

    公开(公告)号：US06472130B1

    公开(公告)日：2002-10-29

    申请号：US09581670

    申请日：2000-10-16

    申请人： Stefan Geyer ,  Michael Horn

    发明人： Stefan Geyer ,  Michael Horn

    IPC分类号： G03F732

    CPC分类号： G03F7/322

    摘要： A solution of tetramethylammonium hydroxide in water comprises a surfactant component and a hydrotropic component. A process for preparing a solution for developing an exposed photoresist comprises the steps: preparation of a solution of tetramethylammonium hydroxide in water; addition of a surfactant component; and addition of a hydrotropic component.

    摘要翻译： 四甲基氢氧化铵在水中的溶液包括表面活性剂组分和水溶助长分子。 制备用于显影曝光光刻胶的溶液的方法包括以下步骤：制备氢氧化四甲基铵在水中的溶液; 加入表面活性剂组分; 并加入水溶助长分子。

    Scanning device
    5.
    发明授权
    Scanning device 有权
    扫描设备

    公开(公告)号：US06250141B1

    公开(公告)日：2001-06-26

    申请号：US09436600

    申请日：1999-11-09

    申请人： Stefan Geyer ,  Michael Horn ,  Rüdiger Hunger

    发明人： Stefan Geyer ,  Michael Horn ,  Rüdiger Hunger

    IPC分类号： G01N1902

    CPC分类号： H01L22/12

    摘要： A scanning device for semiconductor wafers with which rapid and dependable scanning is permitted. The invention is characterized by a base plate with a guiding pin protruding from it for the manual guidance of a depositing plate which is displaceable on the latter. The depositing plate is intended to receive a semiconductor wafer and is provided on an underside with meandering guiding channels for guiding by the guiding pin. A liquid drop is kept on a surface of the semiconductor wafer by a scanning tube and collects metal and dopant traces from the semiconductor wafer. The liquid drop can then be analyzed for determining a purity of the surface of the semiconductor wafer.

    摘要翻译： 一种用于半导体晶片的扫描装置，可以进行快速可靠的扫描。 本发明的特征在于具有从其突出的引导销的底板，用于手动引导可在其上移动的沉积板。 沉积板旨在接收半导体晶片，并且设置在下侧，具有用于由引导销引导的曲折引导通道。 通过扫描管将液滴保持在半导体晶片的表面上，并从半导体晶片收集金属和掺杂物迹线。 然后可以分析液滴以确定半导体晶片的表面的纯度。

    Gassing-free exposure mask
    7.
    发明授权
    Gassing-free exposure mask 有权
    无气味的面膜

    公开(公告)号：US07344807B2

    公开(公告)日：2008-03-18

    申请号：US10843669

    申请日：2004-05-12

    申请人： Stefan Geyer

    发明人： Stefan Geyer

    IPC分类号： G03F1/00

    CPC分类号： G03F1/64

    摘要： The present invention relates to an exposure mask for structuring a photoresist layer on a substrate wafer, in which an inorganic adhesive is used as an adhesive device for connecting a reticle having a lithographic structure, a frame and a pellicle. For chemical reasons, an adhesive of this type has no tendency or a considerably lower tendency to gassing out than an organic adhesive used in conventional exposure masks, so that the risk of particles which are deposited on the lithographic structure and which can cause projection errors during an exposure process is largely ruled out. The invention relates further to a method of producing such an inorganic adhesive and also a method of producing an exposure mask with the aid of such an inorganic adhesive.

    摘要翻译： 本发明涉及用于在基板晶片上构造光致抗蚀剂层的曝光掩模，其中使用无机粘合剂作为用于连接具有光刻结构的掩模版，框架和防护薄膜的粘合装置。 由于化学原因，这种粘合剂与常规曝光掩模中使用的有机粘合剂相比，没有趋向或显着降低倾向的倾向，因此沉积在光刻结构上并且可能导致投影误差的颗粒的风险 很大程度上排除了曝光过程。 本发明还涉及生产这种无机粘合剂的方法，以及借助于这种无机粘合剂制备曝光掩模的方法。

    Slurry transport and storage system
    10.
    发明授权
    Slurry transport and storage system 有权
    泥浆运输和储存系统

    公开(公告)号：US08245565B2

    公开(公告)日：2012-08-21

    申请号：US12131936

    申请日：2008-06-03

    申请人： Stefan Geyer

    发明人： Stefan Geyer

    IPC分类号： G01N11/04

    CPC分类号： G01N11/06

    摘要： An embodiment of the present invention is a transport and storage system for a slurry comprising: a main container; and a test container, the main container and the test container being exposed to the same environmental conditions, the main container and the test container containing a slurry from the same batch, wherein the test container is designed to determine the viscosity of the slurry.

    摘要翻译： 本发明的一个实施例是用于浆料的运输和储存系统，包括：主容器; 以及测试容器，主容器和测试容器暴露在相同的环境条件下，主容器和测试容器含有来自相同批料的浆料，其中测试容器被设计成确定浆料的粘度。