发明授权
- 专利标题： Composite metal material and method for manufacturing the same, etched metal material and method for manufacturing the same and electrolytic capacitor
- 专利标题（中）： 复合金属材料及其制造方法，蚀刻金属材料及其制造方法和电解电容器
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申请号： US10351500申请日： 2003-01-27
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公开(公告)号： US06855408B2公开(公告)日： 2005-02-15
- 发明人: Masatsugu Shimomura , Masaru Tanaka , Hiroshi Yabu , Masafumi Takebayashi , Ryuji Monden , Tamami Koyama , Yoshikazu Hosoda , Masashi Sakaguchi
- 申请人： Masatsugu Shimomura , Masaru Tanaka , Hiroshi Yabu , Masafumi Takebayashi , Ryuji Monden , Tamami Koyama , Yoshikazu Hosoda , Masashi Sakaguchi
- 申请人地址： JP Tokyo
- 专利权人： Showa Denko K.K.
- 当前专利权人： Showa Denko K.K.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2002-017468 20020125
- 主分类号： H01G9/04
- IPC分类号： H01G9/04 ; H01G9/055 ; B32B3/26
摘要：
A composite metallic material 1 according to the invention is used for, e.g., electrolytic capacitors, and includes a metallic material substrate 10 and a high polymer thin layer 11 having a fine pattern 12 formed on at least one surface of the substrate 10 by self-organization. This high polymer thin film 11 is formed by, for example, drying hydrophobic organic solvent solution of high polymer compound. By subjecting this composite metallic material 1 to etching processing, etching pits are formed uniformly with high density based on the fine pattern.
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