Invention Grant
- Patent Title: Charged particle microscope
- Patent Title (中): 带电粒子显微镜
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Application No.: US10395672Application Date: 2003-03-24
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Publication No.: US06855940B2Publication Date: 2005-02-15
- Inventor: Hiroto Mutou
- Applicant: Hiroto Mutou
- Applicant Address: JP Chiba
- Assignee: SII NanoTechnology Inc.
- Current Assignee: SII NanoTechnology Inc.
- Current Assignee Address: JP Chiba
- Agency: Adams & Wilks
- Priority: JP2002-086332 20020326
- Main IPC: H01J37/20
- IPC: H01J37/20

Abstract:
In a charged particle microscope equipped with a sample stage having an inclination function, the invention provides a construction that prevents inclination driving of the sample stage from affecting other peripheral devices to be additionally installed such as an optical microscope. In the charged particle microscope according to the invention, a sample stage having an inclination mechanism includes a rotation support portion of the inclination mechanism on sidewalls of a vacuum chamber, and at least a detection portion of other peripheral devices additionally installed such as (1) an optical microscope, (2) a laser scattering microscope and (3) an optical height detection system is fitted to the rotation support portion inside the chamber in such a fashion as to be capable of moving with a rotary shaft of the inclination mechanism, and members that cannot be arranged in vacuum are installed outside the chamber.
Public/Granted literature
- US20030183775A1 Charged particle microscope Public/Granted day:2003-10-02
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