公开(公告)号：US06855940B2

公开(公告)日：2005-02-15

申请号：US10395672

申请日：2003-03-24

Applicant: Hiroto Mutou

Inventor： Hiroto Mutou

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20214

Abstract: In a charged particle microscope equipped with a sample stage having an inclination function, the invention provides a construction that prevents inclination driving of the sample stage from affecting other peripheral devices to be additionally installed such as an optical microscope. In the charged particle microscope according to the invention, a sample stage having an inclination mechanism includes a rotation support portion of the inclination mechanism on sidewalls of a vacuum chamber, and at least a detection portion of other peripheral devices additionally installed such as (1) an optical microscope, (2) a laser scattering microscope and (3) an optical height detection system is fitted to the rotation support portion inside the chamber in such a fashion as to be capable of moving with a rotary shaft of the inclination mechanism, and members that cannot be arranged in vacuum are installed outside the chamber.

Abstract translation: 在配备有具有倾斜功能的样品台的带电粒子显微镜中，本发明提供了防止样品台的倾斜驱动影响另外安装的其它外围设备的结构的结构，例如光学显微镜。 在根据本发明的带电粒子显微镜中，具有倾斜机构的样品台包括在真空室的侧壁上的倾斜机构的旋转支撑部分，以及另外安装的其它外围装置的检测部分，例如（1） 光学显微镜，（2）激光散射显微镜和（3）光学高度检测系统以能够与倾斜机构的旋转轴一起移动的方式装配在腔室内的旋转支撑部分上，以及 不能排列在真空中的构件安装在室外。