发明授权
US06858088B1 Method and apparatus for treating substrates 有权
处理基材的方法和设备

Method and apparatus for treating substrates
摘要:
To achieve a uniform coating of a substrate, with an apparatus and a method for coating substrates, according to which the substrate is supported on a substrate holder in such a way that a substrate surface that is to be coated is exposed, and the substrate is rotated together with the substrate holder, a cover can be secured to the substrate holder and together with the substrate holder forms a sealed chamber for the substrate.
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