发明授权
- 专利标题: Radiation-emitting semiconductor element and method for producing the same
- 专利标题(中): 辐射发射半导体元件及其制造方法
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申请号: US10239106申请日: 2001-03-16
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公开(公告)号: US06878563B2公开(公告)日: 2005-04-12
- 发明人: Stefan Bader , Berthold Hahn , Volker Härle , Hans-Jürgen Lugauer , Manfred Mundbrod-Vangerow , Dominik Eisert
- 申请人: Stefan Bader , Berthold Hahn , Volker Härle , Hans-Jürgen Lugauer , Manfred Mundbrod-Vangerow , Dominik Eisert
- 申请人地址: DE
- 专利权人: Osram GmbH
- 当前专利权人: Osram GmbH
- 当前专利权人地址: DE
- 代理机构: Fish & Richardson P.C.
- 优先权: DE10020464 20000426; DE10026255 20000526; DE10051465 20001017
- 国际申请: PCTDE01/01002 WO 20010316
- 国际公布: WO0182384 WO 20011101
- 主分类号: H01L27/15
- IPC分类号: H01L27/15 ; H01L33/00 ; H01L33/02 ; H01L33/32 ; H01L33/40 ; H01L33/46 ; H01L21/00
摘要:
This invention describes a radiation-emitting semiconductor component based on GaN, whose semiconductor body is made up of a stack of different GaN semiconductor layers (1). The semiconductor body has a first principal surface (3) and a second principal surface (4), with the radiation produced being emitted through the first principal surface (3) and with a reflector (6) being produced on the second principal surface (4).The invention also describes a production method for a semiconductor component pursuant to the invention. An interlayer (9) is first applied to a substrate (8), and a plurality of GaN layers (1) that constitute the semiconductor body of the component are then applied to this. The substrate (8) and the interlayer (9) are then detached and a reflector (6) is produced on a principal surface of the semiconductor body.
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